EUV Beam Influencing Optical Unit for Divergence Control
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Solution Overview
Problem
Existing EUV radiation generating devices lack efficient methods to influence the beam direction and/or beam divergence of laser beams, which is crucial for precise control and alignment in technological applications.
Innovation Solution
The use of a beam splitter and a mirror element in the EUV radiation generating device, where the beam splitter reflects one entry beam and transmits another, allowing the mirror element to reflect the transmitted beam back to the splitter to form exit beams that can be aligned or diverged, enabling control over the relative beam direction and divergence through adjustable positions and deformable optics.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If beam influencing optics with multiple optical elements are used to control beam direction and divergence, then the control precision is improved, but the device complexity increases
Solution Approach 1:
The patent combines the functions of beam direction control and beam divergence control into a single optical element (mirror or lens) by positioning it to receive both collinear entry beams. This single element simultaneously performs multiple optical functions that would traditionally require separate components, thereby reducing device complexity while maintaining control precision.
Solution Approach 2:
The optical element (mirror or lens) is designed to perform multiple functions: it controls the direction of exit beams relative to each other and also controls the beam divergence. This multi-functional design eliminates the need for separate optical components for each function, simplifying the overall optical system while achieving precise control over beam parameters.
2Manufacturing precision
If multiple optical elements are arranged to influence beam properties, then the beam alignment accuracy is improved, but the manufacturing complexity increases
Solution Approach 1:
The patent merges multiple optical functions into a single manufacturable component. By using one mirror or lens to perform both direction control and divergence control, the manufacturing process is simplified compared to assembling and aligning multiple separate optical elements, thereby improving ease of manufacture while maintaining high alignment accuracy.
Solution Approach 2:
The patent extracts the essential function of beam control from a complex multi-element system and implements it using a single optical element. This extraction simplifies the manufacturing process by eliminating the need for precise assembly and alignment of multiple components, while still achieving the required beam alignment accuracy through the single element's optical properties.
3Adaptability or versatility
If collinear entry beams are processed through separate optical paths, then the beam independence is maintained, but the device complexity increases
Solution Approach 1:
The patent combines the processing of two collinear entry beams into a single optical path by positioning one optical element to receive both beams. This single element processes both beams simultaneously, maintaining their independence in terms of separate entry paths while simplifying the overall device complexity by eliminating the need for separate optical processing paths.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for precise control over the beam direction and divergence of the exit beams, enabling efficient alignment and focusing, even when the entry beams are collinear or have different properties, thereby improving the accuracy and effectiveness of EUV radiation generation.
Implementation Method 1
a beam splitter (2), which is designed to reflect the first entry beam (3a) as a first exit beam (4a) and to transmit the second entry beam (3b)
Implementation Method 2
a beam splitter (2), which is designed to reflect the first entry beam (3a) as a first exit beam (4a) and to transmit the second entry beam (3b)
Implementation Method 3
a mirror element (6), which is arranged in the beam path of the transmitted second entry beam (3b) and which reflects the second entry beam (3b) back to the beam splitter (2), in order to form a second exit beam (4b)
Data Source
Figure 1~3
Figure 4~6
Figure 7
AI summary
The invention relates to an EUV radiation generating device (30), comprising: at least one radiation source (31) for generating a first and second entrance beam (3a, 3b), and a beam influencing optical unit (1) for influencing the first and the second entrance beams (3a, 3b), the second entrance beam being at least partly superimposed on the first, with regard to beam direction and/or beam divergence, the beam influencing optical unit (1) comprising: a beam splitter (2) designed to reflect the first entrance beam (3a) as first exit beam (4a) and to transmit the second entrance beam (3b), and a mirror element (6) arranged in the beam path of the transmitted second entrance beam (3b), said mirror element reflecting the second entrance beam (3b) back to the beam splitter (2) in order to form a second exit beam (4b) which is transmitted by the beam splitter (2) and is at least partly superimposed on the first exit beam (4a). The beam influencing optical unit (1) is designed for influencing an angle between the first and the second exit beams (4a, 4b) and/or for influencing the beam divergence of the first and/or second exit beam(s) (4a, 4b).