EUV Beam Splitting Apparatus for Lithography Stability
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Solution Overview
Problem
Current beam delivery systems for lithographic systems, particularly those using free electron lasers, face challenges in efficiently splitting and distributing EUV radiation beams to multiple tools while maintaining stability and intensity profiles, and are sensitive to beam positioning and thermal variations.
Innovation Solution
A beam splitting apparatus utilizing a plurality of static mirrors and reflective gratings to split a single EUV radiation beam into multiple branch beams, with each branch beam formed from different parts of the original beam, ensuring stability and intensity matching through diffraction and interference, and incorporating expansion and flat-top forming optics to compensate for thermal and positional variations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single radiation beam is split to multiple tools, then productivity is improved, but beam intensity and stability deteriorate
Solution Approach 1:
The radiation beam is segmented into multiple branch beams using a beam splitting apparatus with multiple static mirrors, each mirror directing a portion of the beam to a different tool. This allows a single high-intensity source to serve multiple tools simultaneously while maintaining adequate intensity at each destination.
Solution Approach 2:
Multiple branch beams are combined through optical paths to deliver radiation to multiple tools from a single source. The system merges the functional output of one radiation source across multiple lithographic tools, improving productivity without requiring multiple independent sources.
2Device complexity
If static mirrors are used for beam splitting, then device complexity is reduced, but sensitivity to beam positioning and thermal variations increases
Solution Approach 1:
While the mirrors themselves are static, the system incorporates dynamic compensation mechanisms including adjustable optical elements and feedback control that can adapt to thermal variations and beam positioning changes, maintaining reliable beam delivery despite environmental fluctuations.
Solution Approach 2:
The beam delivery system incorporates feedback control mechanisms that monitor beam position and intensity, automatically adjusting optical elements to compensate for thermal drift and positioning variations, thereby maintaining stable beam delivery to multiple tools.
3Productivity
If multiple branch beams are formed from different parts of the original beam, then productivity is improved, but manufacturing precision deteriorates
Solution Approach 1:
Different regions of the original radiation beam are directed to different tools based on their specific requirements. Each branch beam receives radiation from an optimally selected portion of the source beam, allowing customization of beam characteristics for each tool's specific precision requirements.
Solution Approach 2:
The system can adjust parameters such as beam intensity, wavelength, and focal characteristics for each branch beam by selecting different portions of the original beam and applying specific optical transformations, thereby maintaining manufacturing precision across multiple tools with different requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables efficient and stable distribution of EUV radiation to multiple tools, maintaining the intensity profile of the original beam and reducing sensitivity to beam positioning and thermal changes, thus enhancing the performance and reliability of lithographic systems.
Implementation Method 1
a plurality of static mirrors each arranged to receive a different part of a first radiation beam from a radiation source and to reflect a respective portion of radiation along one of a plurality of directions
Implementation Method 2
Each of the plurality of directions may provide a respective branch optical path... at least one branch optical path may be associated with a plurality of the static mirrors such that at least one branch radiation beam comprises a plurality the reflected portions
Implementation Method 3
ensuring stability and intensity matching through diffraction and interference
Data Source
AI summary
A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.