EUV Beam Splitting Optical Assembly for Multi-Scanner Distribution
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Solution Overview
Problem
Current EUV light distribution systems face challenges in providing simultaneous high-power EUV beams to multiple photolithography scanners without significant power loss, due to complex designs and high costs, as well as issues with reflection losses from mirror surface roughness and non-uniformity.
Innovation Solution
A method and device utilizing a primary splitting optical assembly with grazing incidence convex-like toroidal mirrors to split a high-energy FEL beam into primary EUV sub-beams, which are then reflected to beam-splitting arrays and distributed to EUV distribution optical arrays using collimating concave-like toroidal mirrors, allowing simultaneous distribution to scanners while minimizing power loss.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If a single high-power FEL source is used to provide EUV light, then total output power is improved, but distribution to multiple scanners without significant power loss becomes challenging
Solution Approach 1:
The patent divides the single high-power FEL beam into multiple lower-power sub-beams using beam splitting optics. This segmentation allows the total power to be distributed across multiple scanners simultaneously, reducing the power burden on individual optical components and minimizing cumulative power losses during distribution.
Solution Approach 2:
The patent introduces beam splitting optics and optical benches as intermediary components between the single FEL source and multiple scanners. These intermediaries facilitate efficient power distribution by creating multiple beam paths while maintaining optimal power levels throughout the distribution network.
2Quantity of substance
If undulator switchyard network is used to split FEL beam, then multiple EUV photon beams can be produced, but cost and design complexity increase significantly
Solution Approach 1:
The patent extracts the beam splitting function from the complex undulator switchyard network and implements it using simpler optical components such as mirrors and beam splitters. This extraction maintains the capability to produce multiple EUV photon beams while significantly reducing system complexity and cost.
Solution Approach 2:
The patent replaces the mechanically complex undulator switchyard system with an optical-based beam distribution system. By using optical mirrors and beam splitting components instead of mechanical undulator switching, the system achieves the same beam multiplication function with reduced complexity.
3Device complexity
If time-multiplexing network with mirrors is used, then beam distribution is simplified, but simultaneous use of multiple scanners is not supported
Solution Approach 1:
The patent segments the beam distribution into multiple simultaneous optical paths using beam splitting optics, allowing multiple scanners to operate at the same time. This segmentation replaces the sequential time-multiplexing approach with parallel spatial distribution, maintaining optical simplicity while enabling simultaneous scanner operation.
4Quantity of substance
If split edge mirrors are used to reflect EUV beam, then simultaneous beams to multiple scanners can be provided, but substantial power loss occurs due to surface roughness and edge issues
Solution Approach 1:
The patent uses full-aperture mirrors that can be more easily manufactured and maintained compared to precision edge-split mirrors. By utilizing the entire mirror surface rather than relying on edge reflections, the system achieves better power efficiency while still providing simultaneous beams to multiple scanners.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient and simultaneous distribution of EUV beams to multiple photolithography scanners with minimal power loss, reducing the risk of damage to optics and eliminating edge losses, thus supporting high-volume manufacturing processes.
Implementation Method 1
splitting the primary EUV beam into primary EUV sub-beams; reflecting the primary EUV sub-beams to beam-splitting optical arrays
Implementation Method 2
splitting the primary EUV sub-beams into secondary EUV sub-beams; reflecting the secondary EUV sub-beams to EUV distribution optical arrays
Implementation Method 3
distributing simultaneously the secondary EUV sub-beams to scanners
Data Source
AI summary
Methods for receiving a high-energy EUV beam and distributing EUV sub-beams to photolithography scanners and the resulting device are disclosed. Embodiments include receiving a high-energy primary EUV beam at a primary splitting optical assembly; splitting the primary EUV beam into primary EUV sub-beams; reflecting the primary EUV sub-beams to beam-splitting optical arrays; splitting the primary EUV sub-beams into secondary EUV sub-beams; reflecting the secondary EUV sub-beams to EUV distribution optical arrays; and distributing simultaneously the secondary EUV sub-beams to scanners.