EUV Light Generation Device Cation Neutralization
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Solution Overview
Problem
Existing extreme UV light generation devices face contamination issues due to residual cations depositing on optical components, reducing reflectance and transmittance, and potentially halting EUV light delivery.
Innovation Solution
Incorporating an electron emission unit to neutralize cations generated from plasma, using a magnetic field to converge cations towards outlet ports, and employing exhaust tubes with specific configurations to prevent backflow and collect neutralized substances effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If plasma is generated in the chamber to produce EUV light, then EUV light is generated, but residual cations deposit on optical components causing contamination
Solution Approach 1:
The patent introduces an electron emission unit that emits electrons to neutralize the harmful cations. By converting the harmful charged particles (cations) into neutral atoms through electron attachment, the system eliminates the contamination problem while maintaining the plasma generation process for EUV light production.
Solution Approach 2:
The patent introduces a magnetic field as an intermediary to control cation movement. The magnetic field generating unit creates a magnetic field that converges cations toward the outlet port, preventing them from reaching and depositing on optical components. This intermediary field manages the harmful particles without stopping the useful plasma generation.
2Object-affected harmful factors
If magnetic field is used to converge cations on outlet port, then cations are directed away from optical components, but device complexity increases
Solution Approach 1:
The magnetic field generating unit serves multiple functions: it converges cations toward the outlet port to prevent contamination, and potentially assists in plasma confinement and stability. By making the magnetic field unit multi-functional, the patent reduces the need for separate dedicated components, thereby mitigating the complexity increase.
3Object-affected harmful factors
If electron emission unit is added to neutralize cations, then contamination is reduced, but device complexity increases
Solution Approach 1:
The electron emission unit converts harmful cations into neutral atoms through electron attachment. This chemical/physical neutralization process eliminates the contamination problem. The unit is designed to be integrated into the existing chamber structure, minimizing the complexity increase while achieving effective neutralization.
4Quantity of substance
If exhaust tube is joined to outlet port to remove neutralized substance, then chamber pressure is controlled, but risk of backflow increases
Solution Approach 1:
The exhaust tube system is designed with dynamic pressure control to maintain a pressure gradient that prevents backflow. By actively managing the pressure differential between the chamber and exhaust, the system ensures continuous outward flow of neutralized substances while preventing reverse flow that could contaminate the plasma generation region.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Significantly reduces residual cations within the chamber, minimizes debris formation, and maintains optical component cleanliness, ensuring consistent EUV light delivery to exposure apparatuses.
Implementation Method 1
The magnetic field generating unit may be configured to generate a magnetic field to converge cations on the outlet port
Implementation Method 2
generate a magnetic field to converge cations on the outlet port, the cations being generated from the target substance that has been turned into plasma
Implementation Method 3
The electron emission unit may be configured to emit electrons neutralizing the cations
Implementation Method 4
emit electrons neutralizing the cations
Implementation Method 5
a laser produced plasma (LPP) device that uses plasma generated by applying a laser beam to a target substance
Implementation Method 6
plasma generated by applying a laser beam to a target substance
Data Source
AI summary
An extreme UV light generation device may include: a chamber having a plasma generation region at an inside of the chamber, the chamber receiving a target substance externally supplied to the plasma generation region; an outlet port provided on the chamber; a magnetic field generating unit configured to generate a magnetic field to converge cations on the outlet port, the cations being generated from the target substance that has been turned into plasma in the plasma generation region; an electron emission unit configured to emit electrons neutralizing the cations; and an exhaust tube joined to the outlet port and through which a neutralized substance obtained by neutralizing the cations flows.