EUV Source Chamber Venting and Catcher Cooling for Debris Control
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Solution Overview
Problem
Existing EUV radiation source apparatuses face challenges in efficiently dissipating heat generated during the collision of a tin layer with a laser beam, leading to increased fuel debris accumulation and reduced service life due to high temperatures.
Innovation Solution
Incorporating a catcher to collect fuel debris, a heat dissipation structure to dissipate heat from the catcher, and a venting system to cool the chamber, thereby stabilizing the EUV radiation source and improving its efficiency and service life.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If a tin layer is collided with a laser beam to generate EUV radiation, then EUV radiation is produced, but heat is generated and fuel debris accumulates
Solution Approach 1:
The patent extracts and removes the harmful byproducts (fuel debris and excess heat) from the EUV generation process. A catcher component is introduced to collect fuel debris, and a heat dissipation structure is added to remove excess heat from the chamber, thereby resolving the contradiction between EUV radiation generation and heat/debris accumulation
Solution Approach 2:
The patent converts the harmful effects of heat and fuel debris into beneficial outcomes. The heat dissipation structure transforms excess heat into a controlled thermal management system, and the catcher transforms fuel debris accumulation into a controlled collection and removal process, both improving system stability and service life
2Reliability
If heat is not efficiently dissipated, then fuel debris accumulates, but service life is reduced
Solution Approach 1:
The patent implements feedback mechanisms through the heat dissipation structure and catcher system. These components continuously monitor and remove heat and fuel debris, creating a negative feedback loop that prevents harmful accumulation and extends service life while maintaining reliable EUV radiation generation
3Stability of the object's composition
If the chamber temperature is not controlled, then EUV radiation stability decreases, but cooling mechanisms are needed
Solution Approach 1:
The heat dissipation structure serves multiple functions simultaneously: it cools the chamber, removes fuel debris, and stabilizes EUV radiation output. This multi-functionality approach improves radiation stability without proportionally increasing device complexity, as one component addresses multiple problems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively manages heat dissipation and debris collection, maintaining a stable EUV radiation source operation with reduced temperature fluctuations and enhanced recyclability.
Implementation Method 1
Methods for generating EUV radiation include converting a fuel material from a liquid state into a plasma state. In the plasma state, the fuel material emits photons having the desired wavelength
Implementation Method 2
a tin layer disposed on the crucible... a catcher disposed in the chamber and configured to collect fuel debris generated from a collision of the tin layer and a laser beam
Implementation Method 3
a heat dissipation structure disposed over the catcher... dissipating heat from the catcher to the chamber
Implementation Method 4
a venting system coupled to the EUV source vessel and communicable with the chamber... venting a first gas out of the EUV source vessel to cool the chamber
Data Source
AI summary
An EUV radiation source apparatus includes an EUV source vessel including a chamber, a crucible disposed in the chamber, a catcher disposed in the chamber, a first channel, a second channel, and a first opening formed on the first channel. The catcher includes a first aperture and a second aperture separated from each other. The first channel is adjacent to the first aperture, and the second channel is adjacent to the second aperture. The first channel is configured to introduce a laser beam into the chamber, the second channel is configured to allow EUV radiation to exit the chamber, and the first opening is configured to dissipate heat or gas from the first channel.