EUV Plasma Source Cleanup Laser for Residual Mist Decomposition

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Existing EUV light generation apparatuses face issues with debris deposition due to residual mist, leading to reduced exhaust efficiency, abnormal sensor operations, and frequent maintenance needs, which affect the operation time and reliability.

Innovation Solution

Incorporating a clean-up laser (CUL) device to irradiate residual mist with pulse laser light having a larger spot diameter and controlled timing to decompose it into an atomic state, reducing debris accumulation and improving operational stability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If a first pulse laser device irradiates the target with a small spot diameter to generate high-intensity EUV light, then the EUV light intensity is improved, but residual mist and debris accumulate on chamber surfaces and sensors

Engineering Contradiction:

ImproveEUV light intensityVSAvoiddebris deposition

Core Design Contradiction:

Illumination intensityVSObject-generated harmful factors

Solution Approach 1:

The patent divides the laser irradiation function into two separate devices: a first pulse laser device for generating high-intensity EUV light with a small spot diameter, and a second pulse laser device for cleaning residual mist with a large spot diameter. This segmentation allows each device to be optimized for its specific function without compromise

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The second pulse laser device acts as an intermediary cleaning mechanism that processes the residual mist generated by the first laser device. By introducing this intermediate cleaning step, the system eliminates debris before it accumulates on chamber surfaces and sensors

Inventive Principle:

Principle #24Intermediary (Mediator)

2Productivity

If the EUV light generation apparatus operates continuously, then productivity is improved, but maintenance frequency increases due to debris accumulation

Engineering Contradiction:

Improveoperation timeVSAvoidoperational stability

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The second pulse laser device operates continuously or periodically to clean residual mist during the EUV light generation process. This continuous cleaning action prevents debris accumulation that would otherwise interrupt operation and require maintenance

Inventive Principle:

Principle #20Continuity of useful action

Solution Approach 2:

The system uses its own laser resources to perform self-maintenance by decomposing residual mist in real-time. The second pulse laser device serves the system by cleaning debris that would otherwise require external maintenance intervention

Inventive Principle:

Principle #25Self-service

3Device complexity

If residual mist is not cleaned, then device complexity is reduced, but exhaust efficiency decreases and sensor operations become abnormal

Engineering Contradiction:

Improvesystem structureVSAvoidresidual mist interference

Core Design Contradiction:

Device complexityVSObject-generated harmful factors

Solution Approach 1:

The patent replaces mechanical cleaning systems with an optical field-based solution. The second pulse laser device uses photodissociation to decompose residual mist molecules, substituting a complex mechanical removal system with a simpler optical field approach

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The CUL device effectively decomposes residual mist, extending maintenance intervals, enhancing exhaust efficiency, and minimizing sensor interference, thereby improving the EUV light generation apparatus's operational reliability and uptime.

Implementation Method 1

a first pulse laser device configured to irradiate the target with first pulse laser light in a plasma generation region in the chamber

Methodology Applied

Scientific EffectLaser-induced plasma generation: Plasma

Implementation Method 2

an EUV light concentrating mirror arranged in the chamber and configured to reflect EUV light, radiated from the plasma generation region

Methodology Applied

Scientific EffectEUV light emission from plasma: Luminescence

Implementation Method 3

a second pulse laser device configured to irradiate a diffusion matter, diffused by the irradiation with the first pulse laser light, with second pulse laser light

Methodology Applied

Scientific EffectLaser-induced decomposition: Photodissociation

Data Source

PatentUS20260059641A1EUV light generation apparatus and electronic device manufacturing method

Publication Date: 2026.02.26 GIGAPHOTON INC

AI summary

An EUV light generation apparatus includes a chamber; a target supply device configured to supply a target into the chamber; a first pulse laser device configured to irradiate the target with first pulse laser light in a plasma generation region in the chamber; an EUV light concentrating mirror arranged in the chamber and configured to reflect EUV light, radiated from the plasma generation region, toward an external apparatus; and a second pulse laser device configured to irradiate a diffusion matter, diffused by the irradiation with the first pulse laser light, with second pulse laser light having an irradiation spot diameter larger than an irradiation spot diameter of the first pulse laser light. An intensity of the EUV light generated by the irradiation with the second pulse laser light is smaller than an intensity of the EUV light generated by the irradiation with the first pulse laser light.