EUV Collector Inspection Using UV-VIS Reflection Spectra

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Solution Overview

Problem

EUV collectors in EUV facilities are prone to contamination from by-products of tin droplet vaporization or plasma, leading to reduced EUV reflectance and equipment productivity.

Innovation Solution

An EUV collector inspection apparatus with a light blocking cover, a UV-VIS band light source, and a spectrometer to analyze the spectrum of reflected light for precise contamination assessment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the EUV collector is used continuously in the EUV facility, then productivity is maintained, but contamination accumulates on the reflective surface degrading EUV reflectance

Engineering Contradiction:
ImproveEUV facility productivityVSAvoidEUV reflectance
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The inspection apparatus performs contamination assessment before the EUV reflectance degrades to a level that affects productivity. By detecting contamination early using UV-VIS light reflection analysis, maintenance can be scheduled proactively to clean or replace the EUV collector, preventing productivity loss while maintaining reliable reflectance performance.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If the EUV collector is cleaned or replaced frequently, then EUV reflectance is maintained, but productivity is reduced due to maintenance interruptions

Engineering Contradiction:
ImproveEUV reflectanceVSAvoidEUV facility productivity
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The inspection apparatus provides continuous feedback on the contamination state of the EUV collector by analyzing the reflection spectrum. This feedback enables condition-based maintenance, where cleaning or replacement is performed only when contamination reaches a threshold that would affect reflectance, thereby maintaining reliable performance while minimizing maintenance interruptions to productivity.

Inventive Principle:
Principle #23Feedback

3Device complexity

If conventional inspection methods are used, then the inspection process is simple, but measurement precision is insufficient to accurately assess contamination state

Engineering Contradiction:
Improveinspection apparatus complexityVSAvoidcontamination detection precision
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The inspection apparatus changes the parameter of light wavelength by using UV-VIS band light instead of visible light alone. This parameter change enables detection of contamination that is not visible to the human eye, significantly improving measurement precision for assessing the contamination state of the EUV collector reflective surface.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Precisely determines the contamination state and reflectance of EUV collectors, enabling effective maintenance and preventing productivity loss in EUV facilities.

Implementation Method 1

detecting a spectrum of reflected light from the irradiated light reflected from the front surface of the EUV collector

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 2

a spectrometer above the light source and configured to detect a spectrum of reflected light

Methodology Applied
Scientific EffectAbsorption Spectroscopy: Absorption Spectroscopy

Data Source

PatentUS12487532B2EUV collector inspection apparatus and inspection method
Publication Date: 2025.12.02 SAMSUNG ELECTRONICS CO LTD
  • US12487532B2 patent drawing
  • US12487532B2 patent drawing
  • US12487532B2 patent drawing

AI summary

An extreme ultraviolet (EUV) collector inspection apparatus includes a light blocking cover covering a front surface of an EUV collector to be inspected and providing a space portion in which external light is blocked, a light source in the space portion, the light source having a pillar shape extending along a central axis of the EUV collector, the light source configured to output irradiated light ranging from an ultraviolet (UV) band to a visible light (VIS) band, and a spectrometer above the light source and configured to detect a spectrum of reflected light from the irradiated light reflected from the front surface of the EUV collector. The apparatus or a controller associated therewith may be configured to inspect a contamination state of the front surface of the EUV collector based on the spectrum of reflected light.