EUV Collector Segmentation for Light Throughput
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Solution Overview
Problem
EUV collectors in projection exposure apparatuses face inefficiencies and high production costs due to the need for full surface diffraction gratings to suppress extraneous light, leading to unwanted light losses and increased production expenses.
Innovation Solution
Designing an EUV collector with a separate, non-congruent extraneous light portion as a diffraction grating to divert extraneous light radiation, allowing the remaining surface to focus EUV used light with high efficiency, reducing production costs by minimizing the need for full surface diffraction grating implementation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If the entire collector surface is designed with a diffraction grating for extraneous light suppression, then extraneous light suppression is improved, but used light throughput decreases due to unwanted reflections and production costs increase
Solution Approach 1:
The collector surface is segmented into distinct functional zones: an extraneous light portion equipped with a diffraction grating for suppressing reflected pump light, and a used light portion with high reflectivity for efficient EUV light collection. This segmentation allows each zone to perform its specific function optimally without compromising the other.
Solution Approach 2:
Different regions of the collector surface are assigned different optical properties tailored to their specific functions. The extraneous light portion has diffraction grating structure for suppressing specific wavelengths, while the used light portion maintains high reflectivity across the EUV spectrum. This local differentiation resolves the contradiction by applying the right property in the right location.
2Object-affected harmful factors
If the entire collector surface is designed with a diffraction grating, then extraneous light suppression is improved, but production costs increase due to complex manufacturing requirements
Solution Approach 1:
The collector surface is segmented into distinct functional zones: an extraneous light portion equipped with a diffraction grating for suppressing reflected pump light, and a used light portion with high reflectivity for efficient EUV light collection. This segmentation allows each zone to perform its specific function optimally without compromising the other.
Solution Approach 2:
Different regions of the collector surface are assigned different optical properties tailored to their specific functions. The extraneous light portion has diffraction grating structure for suppressing specific wavelengths, while the used light portion maintains high reflectivity across the EUV spectrum. This local differentiation resolves the contradiction by applying the right property in the right location.
3Object-affected harmful factors
If a diffraction grating is embodied completely over the collector surface, then extraneous light suppression is improved, but device complexity increases
Solution Approach 1:
The collector surface is segmented into distinct functional zones: an extraneous light portion equipped with a diffraction grating for suppressing reflected pump light, and a used light portion with high reflectivity for efficient EUV light collection. This segmentation allows each zone to perform its specific function optimally without compromising the other.
Solution Approach 2:
Different regions of the collector surface are assigned different optical properties tailored to their specific functions. The extraneous light portion has diffraction grating structure for suppressing specific wavelengths, while the used light portion maintains high reflectivity across the EUV spectrum. This local differentiation resolves the contradiction by applying the right property in the right location.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances EUV used light throughput while maintaining effective extraneous light suppression, reducing production costs and minimizing reflection losses, thereby improving overall collector efficiency and cost-effectiveness.
Implementation Method 1
The extraneous light portion is embodied as a diffraction grating for the extraneous light radiation
Implementation Method 2
The used light portion of the overall impingement surface is embodied to guide the EUV used light
Data Source
AI summary
An EUV collector serves for use in an EUV projection exposure apparatus. The collector guides EUV used light emitted by a plasma source region. An overall impingement surface of the collector is impinged upon by radiation emitted by the plasma source region. A used light portion of the overall impingement surface guides the EUV used light. An extraneous light portion of the overall impingement surface is impinged upon by extraneous light radiation, the wavelength of which differs from that of the used light. The used light portion and the extraneous light portion are not congruent. This EUV collector has increased efficiency can involve reduced production costs.