EUV Collector Backsplash Prevention via Tunnel Heating
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Solution Overview
Problem
In extreme ultraviolet (EUV) radiation sources, satellite droplets of tin (Sn) are deflected by hydrogen gas, leading to accumulation on tunnel structure surfaces, causing build-up and backsplash onto the collector, which reduces operational life, increases downtime, and decreases performance.
Innovation Solution
A backsplash-prevention system is implemented, including heat-generating hardware to liquify Sn stalactites, a flowing gas to alter droplet paths, and a vacuum pump to reduce pressure and extract residual Sn, preventing accumulation and backsplash.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If hydrogen gas is used to deflect satellite droplets, then droplet trajectory control is improved, but Sn accumulation on tunnel surfaces occurs causing backsplash
Solution Approach 1:
A heat-generating hardware component is introduced as an intermediary element within the tunnel structure. This component actively heats the tunnel surface to prevent Sn satellite accumulation by maintaining the surface temperature above the melting point of Sn, thereby preventing stalactite formation and subsequent backsplash while preserving the hydrogen gas deflection function
Solution Approach 2:
The harmful accumulation of Sn satellites on the tunnel surface is converted into a beneficial situation by using the heat-generating component to melt and remove accumulated Sn, transforming the accumulation problem into a controlled removal process that prevents backsplash to the collector
2Reliability
If Sn satellites accumulate on tunnel surfaces, then backsplash onto collector is prevented, but operational life of collector decreases
Solution Approach 1:
The heat-generating hardware component performs preliminary action by continuously heating the tunnel surface before Sn accumulation can reach critical levels. This preventive heating maintains the surface temperature above Sn's melting point, preventing stalactite formation and eliminating the need for collector cleaning or replacement, thereby extending collector operational life
3Duration of action of stationary object
If heat-generating hardware is added to prevent Sn accumulation, then collector life is extended, but system complexity increases
Solution Approach 1:
The heat-generating hardware component is designed to serve multiple functions: it prevents Sn satellite accumulation by heating the tunnel surface, and it can also serve as a structural element within the tunnel. This multi-functionality reduces the need for additional separate components, thereby limiting the increase in system complexity while achieving collector protection
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively reduces Sn accumulation in the tunnel structure, extending collector operational life, minimizing downtime, and maintaining EUV radiation source performance by preventing Sn contamination.
Implementation Method 1
heating, by a heat-generating hardware component, the interior surface of the tunnel structure
Implementation Method 2
a first gas flow deflects the Sn satellites from the first path approximately onto a second path
Implementation Method 3
reducing a pressure at an exit region of the tunnel structure to create a vacuum force that contributes to changing paths of the Sn satellites
Data Source
AI summary
Some implementations described herein provide techniques and apparatuses for an extreme ultraviolet (EUV) radiation source that includes a backsplash-prevention system to reduce, minimize, and/or prevent the formation of tin (Sn) build-up in a tunnel structure of a collector flow ring that might otherwise be caused by the accumulation of Sn satellites. This reduces backsplash of Sn onto a collector of the EUV radiation source, increases the operational life of the collector (e.g., by increasing the time duration between cleaning and/or replacement of the collector), reduces downtime of the EUV radiation source, and/or enables the performance of the EUV radiation source to be sustained for longer time durations (e.g., by reducing, minimizing, and/or preventing the rate of Sn contamination of the collector), among other examples.