EUV Light Generation Apparatus Contamination Control
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Solution Overview
Problem
In extreme ultraviolet light generation apparatuses, the accumulation of target substance droplets in unintended areas within the chamber device leads to contamination due to the flow of etching gas, causing the droplets to deviate from their intended path and potentially solidify, resulting in deposits that can interfere with the EUV light generation process.
Innovation Solution
Incorporating a detection unit, such as an image capturing system or pressure sensors, to monitor the accumulation of target substance near critical areas within the chamber device, allowing for real-time detection of potential contamination and automatic cessation of the target supply to prevent droplet accumulation on trajectories, thereby maintaining the cleanliness of the device.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the target supply unit continuously supplies droplets to the chamber device, then the productivity of EUV light generation is improved, but target substance accumulates on the inner wall causing contamination
Solution Approach 1:
The detection unit continuously monitors the inner wall surface near the opening for target substance accumulation and provides feedback to the control unit. When accumulation is detected, the control unit adjusts the target supply unit to stop or reduce supply, creating a closed-loop control system that maintains productivity while preventing contamination.
Solution Approach 2:
The detection unit performs preliminary detection of target substance accumulation before it reaches critical levels that would cause significant contamination. This allows the control unit to take preventive action by stopping target supply in advance, preventing the harmful effect while maintaining continuous operation.
2Object-affected harmful factors
If the target supply unit stops supplying droplets to prevent accumulation, then contamination is reduced, but the productivity of EUV light generation decreases
Solution Approach 1:
The system uses real-time feedback from the detection unit to dynamically control the target supply unit. The supply is stopped only when and where accumulation is detected, rather than continuous stopping, thereby minimizing the impact on productivity while effectively preventing contamination.
Solution Approach 2:
Instead of completely stopping target supply to prevent contamination, the system applies partial action by stopping supply only to the affected area or reducing supply rate, allowing EUV light generation to continue with minimal interruption while preventing further accumulation.
3Object-affected harmful factors
If detection units are added to monitor target substance accumulation, then contamination prevention is improved, but the device complexity increases
Solution Approach 1:
The detection unit uses optical or electromagnetic sensing methods to detect target substance accumulation, replacing complex mechanical sensing systems. This allows for non-contact detection that is simpler to implement and maintain while effectively monitoring contamination risks.
Solution Approach 2:
The detection unit is designed to serve multiple functions: detecting target substance accumulation, monitoring chamber conditions, and providing data for control decisions. This multi-functionality reduces the need for separate specialized components, thereby limiting the increase in device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The implementation of detection units effectively prevents the accumulation of target substance deposits on critical paths, reducing contamination and ensuring the continued operation of the EUV light generation apparatus by stopping the target supply when accumulation thresholds are met, thus maintaining the apparatus's cleanliness and preventing droplet scattering.
Implementation Method 1
a laser produced plasma (LPP) device that uses plasma generated by irradiating a target material with a pulse laser beam
Implementation Method 2
generating, with an extreme ultraviolet light generation apparatus, plasma by irradiating a droplet of a target substance with a laser beam
Data Source
AI summary
An extreme ultraviolet light generation apparatus may include: a chamber device including an internal space; a target supply unit disposed at the chamber device and configured to supply a droplet of a target substance to the internal space; a target collection unit disposed at the chamber device, communicated with the internal space through an opening provided to an inner wall of the chamber device, and configured to collect the droplet passing through the opening; a detection unit disposed at the chamber device and configured to detect the target substance accumulating in the vicinity of the opening of the inner wall; and a control unit configured to stop the target supply unit depending on a result of the detection by the detection unit.