EUV Lithography Controller Data Storage Architecture

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Solution Overview

Problem

Current lithography processes face challenges in efficiently detecting and correcting pattern defects during extreme ultraviolet (EUV) lithography, particularly due to limitations in data transmission bandwidth and communication errors in existing systems, which can lead to inaccuracies in feature formation on semiconductor substrates.

Innovation Solution

A process system comprising a master controller, local controller, switch, and data storage, where the data storage is directly connected to the local controller, allowing independent high-frequency data transmission and reducing bandwidth occupancy, combined with a metrology module for droplet feedback control and EUV light generation, enabling precise control and synchronization of droplet formation and EUV light emission.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If data storage is connected through the switch to the master controller, then communication between controllers is established, but data transmission bandwidth is limited and communication errors occur

Engineering Contradiction:
Improvecommunication reliabilityVSAvoiddata transmission accuracy
Core Design Contradiction:
ReliabilityVSLoss of information

Solution Approach 1:

The patent introduces a data storage device as an intermediary component that is directly connected to the local controller, serving as a buffer between the local controller and the master controller. This intermediary allows data to be stored locally without requiring continuous communication through the switch, thereby eliminating communication errors and bandwidth limitations while maintaining system connectivity.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If the switch handles all data transmission between controllers, then communication paths are established, but bandwidth occupancy is excessive and simultaneous operations are blocked

Engineering Contradiction:
Improvedata transmission efficiencyVSAvoiddata transmission wait time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The patent segments the data transmission path by creating a direct connection between the local controller and data storage device, separating this high-frequency data access path from the general-purpose switch network. This segmentation allows simultaneous read/write operations to occur without competing for switch bandwidth, eliminating wait times and improving overall data transmission efficiency.

Inventive Principle:
Principle #1Segmentation

3Extent of automation

If the local controller communicates with the master controller through the switch for all operations, then centralized control is maintained, but communication errors and bandwidth limitations affect control precision

Engineering Contradiction:
Improvecontroller automation levelVSAvoidpattern formation accuracy
Core Design Contradiction:
Extent of automationVSManufacturing precision

Solution Approach 1:

The patent implements preliminary action by having the local controller store data locally in the data storage device before needing to communicate with the master controller. This pre-positioning of data eliminates communication delays and errors during critical control operations, ensuring that control signals and process data are available immediately for precise pattern formation operations.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enhances the stability and efficiency of EUV lithography by reducing communication errors and allowing simultaneous read/write operations without overloading the switch, thereby improving the accuracy and reliability of pattern formation on semiconductor substrates.

Implementation Method 1

a droplet generator configured to generate target droplets and accelerate the target droplets toward the collector

Methodology Applied
Scientific EffectElectrostatic acceleration: Electrostatics

Implementation Method 2

a pre-pulse laser configured to heat and deform the target droplet

Methodology Applied
Scientific EffectOptical heating: Dielectric Heating

Implementation Method 3

a main pulse laser configured to generate extreme ultraviolet light in response to heating the droplet

Methodology Applied
Scientific EffectLaser-induced plasma emission: Laser

Data Source

PatentUS11237482B2Process system and operating method thereof
Publication Date: 2022.02.01 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US11237482B2 patent drawing
  • US11237482B2 patent drawing
  • US11237482B2 patent drawing

AI summary

A device is disclosed that includes a master controller, a process chamber, a local controller, a switch, and a data storage. The process chamber is configured to generate a data according to a EUV light generation process. The local controller is coupled to the master controller and configured to control the process chamber. The switch is coupled between the master controller and the local controller, wherein the switch is configured to provide paths for the local controller to communicate with the master controller. The data storage directly connected to the local controller and configured to store the data. The local controller communicates directly with the data storage.