EUV Source Stabilization via Crucible Bumps and Eaves

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Solution Overview

Problem

EUV lithography systems face instability and reduced EUV light intensity due to the accumulation of tin debris, which causes defocusing of the laser spot and fluctuations in EUV light generation, affecting the precision and efficiency of semiconductor manufacturing.

Innovation Solution

A rotating crucible with strategically placed bumps and an eave is used to manage the flow of metal debris, converting turbulent flow to laminar flow and directing debris to a catcher, maintaining a stable laser spot size and EUV light intensity by recycling metal debris back to the target region.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If a laser beam is focused onto a metal target to generate EUV light, then EUV light intensity is improved, but tin debris accumulates causing laser spot defocusing and EUV light intensity fluctuations

Engineering Contradiction:
ImproveEUV light intensityVSAvoidEUV light intensity stability
Core Design Contradiction:
Illumination intensityVSReliability

Solution Approach 1:

The invention extracts and removes tin debris from the laser target region using a debris removal system that includes a gas flow to carry debris away from the target area, preventing accumulation and maintaining stable EUV light generation

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The invention introduces a gas intermediary (such as nitrogen or argon gas) that mediates between the laser-target interaction and debris accumulation by carrying tin debris away from the focal region, thereby maintaining laser spot focus and EUV light intensity stability

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If the laser spot size fluctuates due to tin debris accumulation, then manufacturing precision deteriorates, but continuing operation maintains productivity

Engineering Contradiction:
Improvesemiconductor manufacturing throughputVSAvoidlaser spot size precision
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The invention performs preliminary debris removal by establishing a gas flow system that continuously clears tin debris from the target region before significant accumulation occurs, preventing laser spot defocusing and maintaining manufacturing precision throughout operation

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The invention implements a feedback mechanism where EUV light intensity is monitored and used to detect debris accumulation, triggering increased gas flow or other corrective actions to restore laser focus and maintain manufacturing precision

Inventive Principle:
Principle #23Feedback

3Reliability

If the crucible rotates at high speed to manage metal flow, then debris control is improved, but device complexity increases

Engineering Contradiction:
Improvemetal debris controlVSAvoidcrucible rotation mechanism
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The invention merges the debris removal function with the crucible rotation system by integrating gas flow channels and debris ejection mechanisms into the rotating crucible structure, allowing both metal flow management and debris control to be achieved through a single integrated system

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution stabilizes EUV light intensity, enhances the productivity of semiconductor manufacturing by maintaining laser operating standards, and reduces maintenance needs, leading to increased throughput and cost savings.

Implementation Method 1

EUV lithography employs a laser-produced plasma (LPP), which emits EUV light. The LPP is produced by focusing a high-power laser beam, from a carbon dioxide (CO2) laser and the like, onto a metal target, such as tin (Sn), in order to transition it into a highly ionized plasma state.

Methodology Applied
Scientific EffectLaser-produced plasma: Plasma

Implementation Method 2

A rotating crucible with strategically placed bumps and an eave is used to manage the flow of metal debris, converting turbulent flow to laminar flow and directing debris to a catcher

Methodology Applied
Scientific EffectTurbulent flow to laminar flow conversion: Laminar Flow

Data Source

PatentUS20240004318A1EUV source stabilization apparatus and method
Publication Date: 2024.01.04 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20240004318A1 patent drawing
  • US20240004318A1 patent drawing
  • US20240004318A1 patent drawing

AI summary

To improve EUV emission stability, bumps and eaves are added to the interior wall of a rotating crucible that produces EUV light by vaporizing a pre-heated metal, such as tin, using a laser. The bumps and eaves prevent migration of debris and control liquid metal flow, which is otherwise distributed over time by the centrifugal forces generated as the crucible rotates. The bumps and eaves stabilize EUV emissions by changing turbulent liquid metal flow to a predominately laminar flow. Tin catchers of various designs are available to collect and recycle a significant portion of the debris and unused liquid metal. A closed crucible chamber design alleviates non-uniform heating issues.