EUV Light Source Debris Charging and Separation
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Solution Overview
Problem
In extreme ultraviolet (EUV) light source apparatuses, adherent debris on optical elements reduces reflectance and requires effective cleaning methods to maintain performance, as existing systems struggle to efficiently charge and separate debris without re-adhesion.
Innovation Solution
The EUV light source apparatus incorporates a chamber with a debris charging unit and a separation unit, utilizing electromagnetic fields and various charging methods such as electrostatic induction, charged particles, direct current power, ionization lasers, EUV light, and etchant gases to charge and separate debris from optical elements, preventing re-adhesion and enhancing cleaning efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional cleaning methods are used on optical elements, then debris can be removed, but cleaning speed is slow and debris may re-adhere to the optical element
Solution Approach 1:
The patent replaces conventional mechanical cleaning methods with an electromagnetic field-based cleaning system. A charging unit applies electromagnetic fields to charge debris particles, and a separation unit uses electromagnetic forces to separate charged debris from the optical element surface, preventing re-adhesion while achieving rapid cleaning.
Solution Approach 2:
The patent changes the electrical charge parameter of debris particles from neutral to charged state through the charging unit. This parameter change enables the debris to be influenced by electromagnetic fields in the separation unit, allowing for controlled removal and preventing re-adhesion by maintaining electrostatic repulsion.
2Productivity
If electromagnetic fields are used to charge and separate debris, then cleaning efficiency increases and re-adhesion is prevented, but device complexity increases
Solution Approach 1:
The patent merges the charging and separation functions into an integrated cleaning system. The charging unit and separation unit work in sequence within a unified structure, reducing the need for separate complex subsystems while maintaining high cleaning efficiency and preventing debris re-adhesion through continuous electromagnetic field application.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents debris re-adhesion and increases cleaning speed by charging and separating adherent debris using electromagnetic fields and diverse charging techniques, ensuring continuous EUV light production and maintaining optical element reflectance.
Implementation Method 1
an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber
Implementation Method 2
a cleaning unit for charging and separating debris adhered to an optical element inside the chamber
Implementation Method 3
various charging methods such as electrostatic induction, charged particles, direct current power, ionization lasers, EUV light, and etchant gases
Data Source
AI summary
An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.