EUV Lithography Deflection Module for Tin Particle Control
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Solution Overview
Problem
In extreme ultraviolet lithography apparatuses, electrically charged tin particles pose a contamination risk to reticle masks, compromising image integrity on wafers, as they travel from the extreme ultraviolet light source vessel to the scanner, and existing methods fail to effectively deflect these particles without causing arcing or gas ionization.
Innovation Solution
A deflection module using a combination of electric and magnetic fields, created by oppositely charged electrode plates and magnets, respectively, to deflect positively and negatively charged tin particles away from the reticle holder, ensuring they do not hit the optical mirrors or reticle mask, thereby maintaining image integrity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If an electric field is applied to deflect charged tin particles, then particle deflection is achieved, but arcing and gas ionization occur
Solution Approach 1:
The patent combines electric field and magnetic field into a unified deflection system. The electric field (via electrode plates) and magnetic field (via magnets) work together to deflect charged tin particles, allowing the system to achieve effective particle removal while operating at lower electric field amplitudes that prevent arcing and gas ionization
Solution Approach 2:
The patent changes the operational parameters by introducing magnetic field strength as an additional control variable. By adjusting both electric field amplitude and magnetic field strength, the system can optimize particle deflection while maintaining electric field levels below the arcing threshold
2Object-affected harmful factors
If electric field amplitude is increased to improve particle deflection, then deflection capability is enhanced, but arcing and gas ionization occur
Solution Approach 1:
The patent merges electric field and magnetic field functionalities into a single deflection module. This combination allows the system to achieve superior particle deflection performance while maintaining electric field amplitudes below the threshold that causes arcing and gas ionization
Solution Approach 2:
The magnetic field acts as an intermediary that enhances particle deflection without requiring high electric field amplitudes. The Lorentz force from the magnetic field supplements the electric field effect, enabling effective particle control at safer, lower electric field levels
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively deflects charged tin particles, preventing contamination and maintaining image quality by applying both electric and magnetic fields, which can be controlled to minimize electric field amplitude and prevent arcing, enhancing deflection capability beyond the limitations of electric field amplitude alone.
Implementation Method 1
applying an electric field between a first electrode plate and a second electrode plate of a deflection module
Implementation Method 2
electric field lines of the electric field extend from the first electrode plate to the second electrode plate
Implementation Method 3
applying a magnetic field between a first magnet and a second magnet of the deflection module
Implementation Method 4
magnetic field lines of the magnetic field extend from the first magnet to the second magnet, and the magnetic field lines and the electric field lines intersect and are substantially perpendicular to each other
Data Source
AI summary
An apparatus includes an extreme ultraviolet light source vessel having an intermediate focus, a scanner having a light source aperture, and a deflection module arranged between the intermediate focus and the light source aperture. The deflection module includes a first electrode plate and a second electrode plate, configured to create an electric field therebetween. Tin particles moving from the intermediate focus to the light source aperture passes through the deflection module, and are deflected by the electric field therein.