EUV Developer Composition for Uniform Micropattern Formation
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Solution Overview
Problem
Current EUV lithography techniques face challenges in forming uniform fine patterns due to low carbon atom absorption, leading to pattern collapse and decreased sensitivity, which results in insufficient throughput and productivity during semiconductor manufacturing.
Innovation Solution
A developer composition comprising a water-soluble polymer, a nonionic surfactant, and an alkali compound, specifically tetraethyl ammonium hydroxide, tetramethyl ammonium hydroxide, tetrabutyl ammonium hydroxide, potassium hydroxide, sodium phosphate, sodium silicate, or sodium bicarbonate, is used to enhance pattern uniformity and reduce the energy of optimum (EOP) in the development process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If carbon density in the resist film is increased to improve absorption, then absorption efficiency improves, but pattern uniformity deteriorates due to swelling
Solution Approach 1:
A swelling inhibitor compound is introduced as an intermediary substance that mediates between the high carbon density resist material and the development process. This compound suppresses the swelling effect while allowing the high carbon density to maintain its absorption efficiency, thereby resolving the contradiction between improved absorption and maintained pattern uniformity
Solution Approach 2:
The chemical composition parameters of the resist film are modified by incorporating a swelling inhibitor compound with specific molecular characteristics. This parameter change alters the swelling behavior of the resist material during development, enabling high carbon density to be maintained without the adverse swelling effects that would compromise pattern uniformity
2Ease of manufacture
If conventional aqueous alkaline developer is used, then development process is simple, but pattern collapse occurs due to swelling
Solution Approach 1:
The chemical composition of the developer is modified by adding a swelling inhibitor compound to the conventional aqueous alkaline formulation. This parameter change suppresses swelling during development, preventing pattern collapse while maintaining the overall simplicity of the aqueous alkaline development process
Solution Approach 2:
The developer composition is transformed into a composite system combining conventional aqueous alkaline components with a swelling inhibitor compound. This composite developer maintains the beneficial properties of simple aqueous alkaline development while adding the functional property of swelling suppression to prevent pattern collapse
3Length of moving object
If aspect ratio of photoresist pattern is increased to achieve finer pattern, then pattern fineness improves, but pattern collapse increases
Solution Approach 1:
The swelling inhibitor compound acts as an intermediary that protects high aspect ratio patterns from swelling-induced collapse. By suppressing swelling at the molecular level, this compound enables the formation of finer patterns with high aspect ratios while maintaining their structural stability throughout the development process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively forms more uniform patterns and lowers EOP, reducing processing time and manufacturing costs while preventing pattern collapse and improving sensitivity in EUV lithography.
Implementation Method 1
there is a problem in which the absorption of carbon atoms during exposure upon the formation of a fine pattern is low
Implementation Method 2
swelling causes the pattern collapse in a development process using a developer
Implementation Method 3
The generally used developer is an aqueous alkaline developer including tetramethyl ammonium hydroxide (TMAH)
Data Source
AI summary
An extreme ultraviolet (EUV) developer composition for use in manufacturing a semiconductor is provided. More particularly an EUV developer composition for forming a fine pattern is provided, which is capable of forming a more uniform pattern and lowering EOP in a development process, the EUV developer composition including a water-soluble polymer represented by Chemical Formula 1, a nonionic surfactant represented by Chemical Formula 2, and an alkali compound.