EUV Light Generation Discharge Path Debris Management
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Solution Overview
Problem
In extreme ultraviolet light generation apparatuses, debris such as solid tin accumulates on the inner wall surface of the discharge path, encumbering discharge and potentially contaminating the multi-layer reflective film, due to stannane decomposition or tin ion neutralization during the discharge process.
Innovation Solution
A gas supply unit is configured to supply gas into the discharge path through the inner wall surface, preventing debris accumulation by etching any accumulated tin and maintaining a clean surface, thereby ensuring uninterrupted discharge and minimizing contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If gas is not supplied into the discharge path, then the discharge path structure remains simple, but debris accumulates on the inner wall surface encumbering discharge
Solution Approach 1:
The patent introduces a gas supply system that delivers gas into the discharge path to prevent debris accumulation. The gas flow creates a protective atmosphere that inhibits stannane decomposition and tin ion neutralization on the inner wall surface, thereby maintaining discharge efficiency without requiring complex mechanical cleaning mechanisms.
Solution Approach 2:
The patent employs an inert gas atmosphere within the discharge path to prevent chemical reactions that lead to debris formation. By maintaining an inert environment, the system prevents stannane decomposition and tin ion neutralization on the inner wall surface, eliminating debris accumulation while keeping the structural design relatively simple.
2Object-affected harmful factors
If gas is not supplied into the discharge path, then the system structure remains simple, but tin contamination occurs on the multi-layer reflective film
Solution Approach 1:
The gas supply system uses controlled gas flow to create a protective atmosphere that prevents tin ions from reaching and contaminating the multi-layer reflective film. The gas flow pattern is designed to sweep away potential contaminants before they can deposit on sensitive surfaces, reducing contamination without requiring additional complex shielding structures.
Solution Approach 2:
By introducing an inert gas atmosphere into the discharge path, the patent prevents chemical reactions that会产生 tin contamination. The inert environment stabilizes tin ions and prevents their neutralization and deposition on the multi-layer reflective film, effectively reducing contamination while adding only a gas supply component to the system.
3Productivity
If the discharge path is not cleaned, then maintenance complexity is reduced, but debris accumulation encumbers discharge and reduces efficiency
Solution Approach 1:
The patent implements preliminary action by continuously supplying gas into the discharge path to prevent debris accumulation before it can encumber the discharge process. This proactive approach maintains discharge efficiency throughout operation without requiring subsequent cleaning interventions, thereby reducing maintenance complexity while ensuring sustained productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The gas supply effectively prevents debris accumulation and contamination, ensuring continuous and efficient EUV light generation by maintaining a clean inner wall surface of the discharge path.
Implementation Method 1
supplying gas into the discharge path through an inner wall surface of the discharge path, thereby preventing debris accumulation
Implementation Method 2
a magnet positioned outside the chamber, the magnet forming a magnetic field inside the chamber
Implementation Method 3
generates extreme ultraviolet light by irradiating a target with a pulse laser beam
Implementation Method 4
extreme ultraviolet (EUV) light generation apparatus that generates extreme ultraviolet (EUV) light at a wavelength of 13 nm
Data Source
AI summary
An extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target with a pulse laser beam includes: a chamber; a magnet that is positioned outside the chamber and forms a magnetic field (70) inside the chamber; a discharge path (37a) that is opened at a position on an inner wall surface of the chamber where the inner wall surface intersects a central axis of the magnetic field (70) and through which gas inside the chamber is discharged; and a gas supply unit (10a) configured to supply gas into the discharge path (37a) through an inner wall surface of the discharge path.