EUV Discharge Volume Shaping via Multi-Beam Plasma Expansion
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Solution Overview
Problem
Existing EUV radiation generating devices face issues with spatial fluctuations in the discharge region and geometrical mismatch between the light emission volume and optical systems, leading to inefficient use and limited output power.
Innovation Solution
The method involves applying pulsed energy beams at multiple lateral locations on a moving surface between electrodes, expanding the discharge volume and shaping it to match the optical system's acceptance area, allowing for more effective radiation use and increased output power by distributing energy beam pulses appropriately.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single pulsed energy beam is applied to generate plasma, then the device structure is simple, but the discharge volume is small and exhibits spatial fluctuations
Solution Approach 1:
The invention divides the single energy beam application into multiple energy beams applied at different lateral locations. Each energy beam creates a separate plasma generation point, and the combination of multiple plasma regions forms a larger, more stable discharge volume that reduces spatial fluctuations.
2Volume of moving object
If the discharge volume is small, then the device is compact, but the geometrical form does not match the optical system's circular apertures
Solution Approach 1:
The invention extends the discharge volume from a single-point (0D) or line (1D) configuration to a two-dimensional area by applying energy beams at multiple lateral locations. This creates a discharge region that can be shaped to match the circular aperture geometry of the optical system, improving adaptability.
3Power
If multiple energy beams are applied at different lateral locations, then the output power increases and radiation usage efficiency improves, but the device complexity increases
Solution Approach 1:
The invention combines multiple energy beams and their corresponding plasma generation regions into a unified discharge volume. This merging approach allows the system to achieve higher output power through increased plasma volume while managing device complexity by integrating the multiple beams into a coordinated system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces relative spatial fluctuations, adapts the light emission volume to optimize radiation usage, and doubles the output power by applying multiple pulses simultaneously while maintaining the required distance, ensuring effective radiation utilization and stability.
Implementation Method 1
a liquid material, in particular a metal melt, which is applied to a surface moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams
Implementation Method 2
The resulting current heats the metal vapor such that the desired ionization stages are excited and radiation of the desired wavelength is emitted from a pinch plasma
Data Source
AI summary
The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to a surface moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device the pulses (9) of said pulsed energy beams are directed to at least two different lateral locations with respect to a moving direction of said surface. With this measure, the radiation emission volume is expanded, less sensitive to spatial fluctuations and can be adapted better to the requirements of optical systems of any applications. Furthermore, the optical output power can be increased by this measure.