Instrumented Substrate for EUV Dosage Calibration
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
There is a need for improved monitoring systems in semiconductor processing environments to ensure uniformity of EUV and UV illumination, as existing technologies fall short in accurately measuring and calibrating these radiation conditions.
Innovation Solution
An instrumented substrate is developed, equipped with in-band and out-of-band dosage sensors, as well as a controller to compare and analyze these measurements, determining the signal composition of the illumination and transmitting relevant data for calibration and monitoring purposes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If existing monitoring systems are used, then the system complexity is low, but the measurement precision of EUV radiation is insufficient
Solution Approach 1:
The monitoring system is segmented into multiple independent dosage sensors (in-band and out-of-band sensors) that can be individually calibrated and positioned. Each sensor measures specific wavelength ranges, allowing precise EUV radiation measurement while distributing system complexity across multiple simple, specialized components rather than one complex system.
Solution Approach 2:
The patent introduces an intermediary calibration process using a calibrated reticle with known dosage values. This intermediary reference standard allows the dosage sensors to be calibrated against a traceable standard without requiring direct comparison between multiple sensors, thereby achieving high measurement precision while managing system complexity through a standardized calibration approach.
2Measurement precision
If multiple dosage sensors are used to measure EUV and UV illumination, then the measurement precision improves, but the device complexity increases
Solution Approach 1:
The sensor system is segmented into functionally distinct in-band dosage sensors (for EUV wavelength 10-20 nm) and out-of-band dosage sensors (for UV wavelength 100-400 nm). This segmentation allows each sensor type to be optimized for its specific wavelength range, improving measurement precision for different illumination components while maintaining manageable complexity through standardized sensor designs.
Solution Approach 2:
The dosage sensors are designed with universal functionality to measure both in-band EUV illumination and out-of-band UV illumination, as well as scattered illumination. This multi-functionality allows a single sensor type to perform multiple measurement tasks, improving overall measurement capability while avoiding the complexity of multiple specialized sensor systems.
3Measurement precision
If in-band and out-of-band dosage sensors are positioned adjacent to each other, then the measurement of signal composition is improved, but the manufacturing precision requirements increase
Solution Approach 1:
The sensor array is segmented into distinct in-band and out-of-band sensor regions with clearly defined spatial relationships. This segmentation allows for standardized mounting patterns and simplified alignment procedures, reducing manufacturing precision requirements while maintaining the ability to measure signal composition through the adjacent positioning of different sensor types.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The instrumented substrate provides precise measurements of EUV radiation, enabling effective calibration and monitoring of EUV lithography systems, thereby improving the uniformity and quality of semiconductor processing.
Implementation Method 1
a photodiode, wherein the photodiode is disposed in the cavity and aligned with the aperture, wherein the photodiode is configured to receive the illumination through the aperture
Implementation Method 2
an absorptive layer, wherein the absorptive layer defines a cavity and an aperture
Data Source
AI summary
An instrumented substrate may provide a metrology platform for monitoring extreme ultraviolet (EUV) radiation in an image plane of a EUV lithography tool. The instrumented substrate may include in-band dosage sensors. The in-band dosage sensors may generate dosage measurements corresponding to the illumination which is in-band. The instrumented substrate may also include out-of-band dosage sensors and in-band scattered dosage sensors. The instrumented substrate may be housed within a front opening unified pod (FOUP) of a system.