EUV Light Source Droplet Trajectory Correction
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Solution Overview
Problem
Existing EUV light source devices face instability in EUV output due to nozzle clogging, thermal deformation, and rapid changes in droplet ejection direction, leading to inconsistent interaction between target material droplets and the laser beam, which cannot be effectively corrected by existing position monitoring and control mechanisms.
Innovation Solution
An extreme ultraviolet light source device incorporating a droplet generation device, a charge supply device, and a trajectory correction device that generates a force field, such as an electric or magnetic field, to correct the trajectory of charged target material droplets, ensuring they align with the plasma emission point, thereby stabilizing EUV output.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If position monitoring and control mechanisms are used to correct droplet position offset, then droplet positioning accuracy is improved, but device complexity increases and instantaneous direction changes cannot be corrected
Solution Approach 1:
The patent replaces the mechanical position monitoring and control system with an electric field-based trajectory correction system. Charged droplets are deflected by electric fields generated between pairs of electrodes, eliminating the need for complex mechanical actuators and position sensors while enabling rapid response to instantaneous direction changes.
Solution Approach 2:
The patent changes the control parameter from mechanical position adjustment to electric field strength modulation. By adjusting the voltage applied to electrode pairs, the system can rapidly correct droplet trajectories without mechanical movement, achieving both high precision and simplicity.
2Manufacturing precision
If droplet generation device is displaced to correct ejection direction changes, then droplet alignment is improved, but response speed to instantaneous changes deteriorates
Solution Approach 1:
The patent replaces mechanical displacement of the droplet generation device with electric field-based trajectory correction. The electric field can be modulated instantaneously, providing rapid response to direction changes without mechanical inertia or actuation delays.
Solution Approach 2:
The patent uses periodic scanning of electrode pairs to correct droplet trajectories. By sequentially activating different electrode pairs along the droplet path, the system achieves continuous trajectory correction with rapid response capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables stable EUV output by correcting instantaneous changes in droplet direction without the need for position measurement equipment or control mechanisms, ensuring consistent interaction between droplets and the laser beam, thus improving the reliability of EUV light generation.
Implementation Method 1
a charge supply device that charges the target material droplets outputted by the droplet generation device
Implementation Method 2
a trajectory correction device that generates a force field for correcting the trajectory of the target material droplets charged by the charge supply device, the force field exerting a force on the charged target material droplets
Implementation Method 3
the force field exerting a force on the charged target material droplets in such a manner that the charged target material droplets travel towards the plasma emission point
Implementation Method 4
a laser light source that irradiates a laser beam onto the charged target material droplets at the plasma emission point, to turn the target material into plasma
Implementation Method 5
to turn the target material into plasma
Implementation Method 6
The target material is turned into plasma through irradiation of a pulsed driver laser, whereupon the EUV light radiated by the plasma
Data Source
AI summary
Offset in the ejection direction of target material droplets is corrected in order to stabilize EUV output in an EUV light source device. An extreme ultraviolet light source device includes a droplet generation device 110 that outputs target material droplets 101 towards a predetermined plasma emission point 103; a charging device 130 that charges the target material droplets 101; a trajectory correction device 140 that generates a force field in the trajectory to correct the travel direction of the charged target material droplets 101a so that the charged target material droplets 101a travel towards the plasma emission point 103; and a laser light source 150 that irradiates, at the plasma emission point 103, a laser beam onto the charged target material to generate plasma thereby.