EUV Light Generation Droplet Imaging Synchronization

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Solution Overview

Problem

Current EUV light generation systems face challenges in precisely measuring and controlling the states of droplets and plasma light in the plasma generation region, leading to inefficiencies and increased complexity, particularly due to phenomena like smearing and blooming during high-repetition-frequency operations.

Innovation Solution

An EUV light generation apparatus is designed with a chamber containing a plasma generation region, a target supply part that outputs targets as droplets, a droplet detector, an imaging part to capture images of the droplet and plasma light, and a controller that synchronizes imaging timing with droplet detection to control the position and timing of the pulsed laser beam, allowing precise measurement and control of droplet and plasma light states.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a single imaging part is used to capture both droplet and plasma light images, then device complexity is reduced, but measurement precision deteriorates due to smearing and blooming effects

Engineering Contradiction:
Improvesystem complexityVSAvoidmeasurement precision
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The imaging process is segmented into multiple sequential stages: droplet detection, droplet imaging, laser irradiation, and plasma light imaging. Each stage is captured at optimized timing to avoid interference between droplet and plasma light measurements, resolving the contradiction between using a single imaging part and maintaining measurement precision.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The system employs periodic pulsed laser irradiation synchronized with droplet delivery, creating distinct time windows for droplet imaging and plasma light imaging. This periodic action allows the single imaging part to capture both types of images without smearing or blooming by controlling the imaging timing to match the periodic cycle.

Inventive Principle:
Principle #19Periodic action

2Ease of operation

If imaging timing is not synchronized with droplet detection, then operation simplicity is improved, but manufacturing precision deteriorates due to poor droplet position control

Engineering Contradiction:
Improveoperation simplicityVSAvoiddroplet position control
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The droplet detector provides real-time feedback on droplet arrival timing, which the controller uses to dynamically adjust and synchronize the imaging timing. This feedback mechanism maintains manufacturing precision for droplet position control while keeping the operation simple through automated timing synchronization.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enables precise measurement and control of droplet and plasma light states, reducing inefficiencies and system complexity by capturing images of both droplets and plasma light using a single imaging part, thereby improving the EUV light generation process.

Implementation Method 1

a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region

Methodology Applied
Scientific EffectLight absorption/scattering: Absorption (EM radiation)

Implementation Method 2

an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber

Methodology Applied
Scientific EffectPlasma radiation: Radiation

Implementation Method 3

irradiating the target with a laser beam so that the target is turned into plasma and emits plasma light

Methodology Applied
Scientific EffectLaser ablation and plasma generation: Laser Ablation

Implementation Method 4

an SR (synchrotron radiation) type system using synchrotron orbital radiation

Methodology Applied
Scientific EffectSynchrotron radiation: Synchrotron Radiation

Data Source

PatentUS10172225B2Extreme ultraviolet light generation apparatus
Publication Date: 2019.01.01 GIGAPHOTON INC
  • US10172225B2 patent drawing
  • US10172225B2 patent drawing
  • US10172225B2 patent drawing

AI summary

An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.