EUV Light Generation Droplet Pressure Feedback Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current EUV light generation systems face challenges in maintaining uniformity and stability of droplets in the plasma generation region, leading to fluctuations in droplet size, position, speed, and flow rate, which affects the synchronization of laser beam emission and droplet supply, impacting the stability and efficiency of EUV light generation.
Innovation Solution
An EUV light generation apparatus that includes a target supplier to output a target as a droplet, a droplet measurement unit to measure parameters such as diameter, position, speed, and flow rate, and a pressure regulator controlled by a target generation controller to maintain uniform droplet state, ensuring precise regulation of pressure and synchronization with laser beam emission.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If pressure regulation is implemented to control droplet output, then droplet uniformity is improved, but device complexity increases
Solution Approach 1:
The patent implements a feedback control system where droplet parameters (diameter, position, speed, flow rate) are measured by a droplet measurement unit, and the pressure regulator adjusts pressure based on these measurements to maintain uniform droplet output. This closed-loop feedback mechanism resolves the contradiction by automatically adjusting pressure to compensate for variations, improving droplet uniformity without requiring complex manual intervention.
Solution Approach 2:
The patent changes the pressure parameter dynamically to control droplet characteristics. By regulating pressure in the target supplier chamber, the system controls droplet diameter, position, speed, and flow rate. This parameter-based control approach improves droplet uniformity through systematic adjustment rather than complex mechanical modifications.
2Measurement precision
If real-time measurement and control are implemented, then synchronization accuracy is improved, but device complexity increases
Solution Approach 1:
The patent employs real-time feedback measurement of droplet parameters (position, speed, diameter) and uses this information to control laser beam emission timing. The droplet measurement unit continuously monitors droplet state, and the control system adjusts laser emission to achieve precise synchronization. This feedback mechanism improves synchronization accuracy while keeping the control logic systematic rather than overly complex.
Solution Approach 2:
The patent performs preliminary measurement of droplet parameters before laser irradiation. By measuring droplet diameter, position, and speed in advance, the system can pre-calculate optimal laser emission timing and positioning, improving synchronization accuracy without requiring complex real-time adjustments during the actual irradiation process.
3Stability of the object's composition
If pressure regulation is used to maintain droplet state, then droplet stability is improved, but energy consumption increases
Solution Approach 1:
The patent regulates pressure as a key parameter to maintain droplet stability in the target supplier chamber. By controlling pressure, the system maintains consistent droplet formation without requiring continuous mechanical intervention or high-energy operations. The pressure regulation provides a stable environment for droplet generation, improving droplet stability while consuming relatively low energy compared to active heating or cooling systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus stabilizes droplet parameters in real-time, ensuring consistent EUV light generation by synchronizing droplet supply with laser beam timing, thereby improving the stability and efficiency of EUV light production.
Implementation Method 1
a target supplier (26) configured to output a target (27) into a chamber (2) as a droplet (271), the target (27) generating extreme ultraviolet light when being irradiated with a laser beam in the chamber (2)
Data Source
AI summary
An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit.