EUV Radiation Source Exhaust Paths for In-Line Debris Maintenance

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Solution Overview

Problem

The accumulation of debris on the collector in EUV radiation sources degrades reflectivity, leading to contamination and reduced efficiency, necessitating frequent maintenance and downtime.

Innovation Solution

An exhaust system with active and passive debris isolation devices and a debris handling system that allows for in-line maintenance by alternating gas flow paths to manage debris, preventing tin spitting and maintaining system cleanliness.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If debris is not removed from the collector, then the system operates continuously, but reflectivity degrades and contamination increases

Engineering Contradiction:

Improvecollector reflectivityVSAvoidmaintenance downtime

Core Design Contradiction:

ReliabilityVSLoss of time

Solution Approach 1:

The exhaust system is divided into multiple independent paths (first exhaust path with debris handling device, second exhaust path without debris handling device). This segmentation allows selective operation modes where debris can be managed in one path while the other path remains operational, enabling continuous or near-continuous system operation without complete shutdown for maintenance.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The system dynamically switches between different exhaust paths based on operational requirements. The controller can alternate gas flow between the first and second exhaust paths, allowing the debris handling device to be periodically cleaned or maintained while the other path continues to serve the collector, thus reducing maintenance downtime.

Inventive Principle:

Principle #15Dynamics

2Object-affected harmful factors

If debris handling device is always operational, then contamination is prevented, but device complexity increases

Engineering Contradiction:

ImprovecontaminationVSAvoidexhaust system complexity

Core Design Contradiction:

Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The exhaust system is segmented into multiple independent paths, allowing the debris handling device to be selectively activated only when needed rather than being permanently operational. This reduces the continuous complexity burden while maintaining contamination prevention capability when the debris handling device is active.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The controller acts as an intermediary that manages the complexity by automatically switching between exhaust paths based on the operational state of the debris handling device. This intermediary control simplifies the overall system operation by handling the path selection logic, allowing the debris handling device to be periodically maintained without requiring constant manual intervention.

Inventive Principle:

Principle #24Intermediary (Mediator)

3Ease of repair

If gas flow path is blocked for maintenance, then debris handling device can be cleaned, but system operation stops

Engineering Contradiction:

Improvedebris handling device maintenanceVSAvoidsystem operation continuity

Core Design Contradiction:

Ease of repairVSProductivity

Solution Approach 1:

The exhaust system is segmented into multiple independent gas flow paths, allowing maintenance of the debris handling device in one path without affecting the other path. This enables the system to continue operating through the alternative path while maintenance is performed, thus maintaining productivity during repair activities.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The system dynamically redirects gas flow between different exhaust paths during maintenance operations. When the debris handling device requires cleaning, the controller blocks the first exhaust path and redirects flow through the second exhaust path, allowing maintenance to proceed without stopping overall system operation and preserving productivity.

Inventive Principle:

Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system maintains collector reflectivity and prevents contamination, reducing maintenance time and ensuring stable plasma generation for improved lithography performance.

Implementation Method 1

a laser source configured to emit a laser beam to excite the target material to form a plasma

Methodology Applied

Scientific EffectLaser excitation: Laser

Implementation Method 2

excite the target material to form a plasma

Methodology Applied

Scientific EffectPlasma generation: Plasma

Implementation Method 3

directing a gas from the vessel into a first debris handling device

Methodology Applied

Scientific EffectGas flow:

Implementation Method 4

removing a debris of the target material in the gas in the first exhaust line

Methodology Applied

Scientific EffectDebris removal: Filter (physical)

Data Source

PatentUS20250328089A1Radiation source apparatus and method for operating the same

Publication Date: 2025.10.23 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD

AI summary

A method for operating a radiation source apparatus is provided. The method includes producing extreme ultraviolet (EUV) radiation by emitting a laser onto a target material in a vessel; directing a gas from the vessel into a first debris handling device; blocking the gas from the first debris handling device; and perform a maintenance process on the first debris handling device when the gas is blocked from the first debris handling device.