EUV Source Exhaust Pipe Acute Angle Residue Removal
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Solution Overview
Problem
Existing EUV sources face challenges in effectively exhausting residues, which can lead to contamination and defects in semiconductor devices during the exposure process.
Innovation Solution
The EUV source incorporates a housing with a cone-shaped light-collecting space, an EUV collector with a reflection surface, and an exhaust pipe that forms an acute angle with the housing, providing an effective exhaust flow path to remove residues.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a conventional exhaust pipe configuration is used, then the structure is simple, but the residue exhaustion efficiency is insufficient
Solution Approach 1:
The exhaust pipe is configured to extend at an acute angle relative to the longitudinal axis of the light-collecting space, creating an asymmetric arrangement that optimizes the exhaust flow path. This angular configuration allows the exhaust pipe to effectively intercept and remove residue particles generated during EUV light generation, improving residue exhaustion efficiency while maintaining structural simplicity
Solution Approach 2:
The exhaust pipe extends in a direction that forms an acute angle with the longitudinal axis, utilizing a dimensional approach that optimizes the spatial arrangement. This angular extension creates an effective exhaust flow path that efficiently removes residue from the light-collecting space, enhancing productivity without significantly increasing device complexity
2Reliability
If residue is not effectively exhausted, then the structure remains simple, but contamination increases causing defects
Solution Approach 1:
The exhaust pipe is strategically positioned and configured to extract and remove residue particles from the light-collecting space. By extending at an acute angle, the exhaust pipe creates an efficient flow path that continuously removes harmful residue, preventing contamination that would otherwise cause defects in semiconductor devices
Solution Approach 2:
The exhaust pipe configuration converts the potentially harmful residue particles into a manageable flow that can be effectively removed. The acute angle configuration creates a beneficial exhaust flow pattern that actively eliminates contamination, transforming the harmful residue into a controlled exhaust stream that protects device quality
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures efficient residue removal, reducing contamination in the EUV source and improving the exposure process, thereby enhancing the quality and reliability of semiconductor device manufacturing.
Implementation Method 1
the exhaust pipe extends from the housing and forms an acute angle with the housing toward a second end portion of the housing
Implementation Method 2
an EUV collector disposed at a first end portion of the housing and including a reflection surface disposed toward the light-collecting space
Data Source
AI summary
An extreme ultraviolet (EUV) source includes a housing providing a light-collecting space having a cone shape becoming narrower in a first direction, an EUV collector disposed at a first end portion of the housing and including a reflection surface disposed toward the light-collecting space, and an exhaust pipe coupled to the housing and providing an exhaust flow path connected to the light-collecting space, wherein the exhaust pipe extends from the housing and forms an acute angle with the housing toward a second end portion of the housing.