EUV Light Generating System Feedforward Control

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Solution Overview

Problem

Existing extreme ultraviolet light generating systems face challenges in maintaining consistent EUV energy output due to shifts in the focusing position of pulsed laser beams caused by thermal deformation of optical elements during burst operations, leading to decreased EUV energy over time.

Innovation Solution

The system employs a combination of actuators and a feedforward control mechanism to adjust and maintain the focusing position of the pulsed laser beam, using control patterns stored in memory to compensate for shifts during burst operations, ensuring stable EUV light generation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If burst operations are performed to increase EUV light output, then productivity is improved, but thermal deformation of optical elements causes focusing position shifts that degrade manufacturing precision

Engineering Contradiction:
ImproveEUV light outputVSAvoidfocusing position
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The system performs preliminary actions by storing control patterns in advance that correspond to different burst operation conditions. Before executing a burst operation, the appropriate control pattern is selected and prepared, enabling proactive compensation for thermal deformation effects without real-time measurement delays.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system implements feedback control by measuring the actual focusing position during burst operations and comparing it with the target position. Based on this feedback, the actuator adjusts the optical elements to correct focusing position shifts caused by thermal deformation, maintaining manufacturing precision during high-productivity burst operations.

Inventive Principle:
Principle #23Feedback

2Stability of the object's composition

If continuous laser beam irradiation is used to maintain plasma generation, then EUV energy consistency is improved, but thermal accumulation causes optical element deformation that reduces reliability

Engineering Contradiction:
ImproveEUV energy consistencyVSAvoidsystem stability
Core Design Contradiction:
Stability of the object's compositionVSReliability

Solution Approach 1:

The system dynamically adjusts the laser beam irradiation parameters and optical element positions during continuous operation. By continuously monitoring focusing position and actively controlling actuators to compensate for thermal deformation, the system maintains EUV energy consistency while adapting to changing thermal conditions, ensuring long-term operational reliability.

Inventive Principle:
Principle #15Dynamics

3Manufacturing precision

If feedforward control with stored patterns is implemented to compensate focusing shifts, then manufacturing precision is improved, but device complexity increases

Engineering Contradiction:
Improvefocusing position accuracyVSAvoidcontrol system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The system reduces control complexity by performing preliminary action - storing pre-calculated control patterns in memory before operation. These patterns contain the compensation adjustments needed for various burst operation scenarios, eliminating the need for complex real-time calculations and simplifying the control architecture while maintaining high focusing position accuracy.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach stabilizes EUV light output by effectively managing shifts in the focusing position, maintaining consistent EUV energy levels throughout burst periods and reducing the impact of thermal deformation on optical elements.

Implementation Method 1

extreme ultraviolet light which is generated by a target turning into plasma by being irradiated with a pulsed laser beam

Methodology Applied
Scientific EffectLaser ablation: Laser Ablation

Data Source

PatentUS10085334B2Extreme ultraviolet light generating system
Publication Date: 2018.09.25 GIGAPHOTON INC
  • US10085334B2 patent drawing
  • US10085334B2 patent drawing
  • US10085334B2 patent drawing

AI summary

An extreme ultraviolet light generating system repetitively outputs extreme ultraviolet light emitted by a target that turns into plasma by being irradiated with a pulsed laser beam. The extreme ultraviolet light generating system may include: a target supply unit that sequentially supplies the target to a plasma generating region set within a chamber, an actuator connected to a laser beam focusing system that focuses the pulsed laser beam output from a laser apparatus that adjusts the focusing position of the pulsed laser beam, an extreme ultraviolet light generation controller that controls the extreme ultraviolet light generating system to output extreme ultraviolet light based on a burst pattern, and an actuator controller that controls the actuator to compensate for shifts of the focusing position of the pulsed laser beam during a burst operation by feedforward control.