EUV Light Source Beam Positioning with Four-Mirror Control
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Solution Overview
Problem
Existing EUV light sources lack precise positioning and adjustment of focused pulsed laser beams on target materials, limiting their dynamic range and adjustment resolution.
Innovation Solution
The EUV light source employs a beam guiding device with four rotatable mirrors arranged in pairs, allowing for precise adjustment of the spatial position and angle of incidence of pulsed laser beams, utilizing galvanometer drives for high dynamic and angular resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional beam guiding devices are used, then the structure is simple, but the positioning precision and adjustment resolution are insufficient
Solution Approach 1:
The beam guiding device is segmented into multiple independent mirror pairs, each responsible for specific spatial dimensions. This segmentation allows precise control of beam position in different directions while maintaining modular structure that manages complexity.
Solution Approach 2:
The invention transitions from single-mirror or simple multi-mirror systems to a four-mirror pair configuration that operates in multiple spatial dimensions simultaneously, enabling comprehensive 3D beam positioning with micrometer accuracy.
2Measurement precision
If fewer mirrors are used, then the device complexity is low, but the adjustment resolution and dynamic range are limited
Solution Approach 1:
Each mirror is equipped with independent galvanometer drives that enable dynamic adjustment of mirror angles with high resolution. This dynamic control system allows rapid repositioning of the laser beam while maintaining precise angular resolution throughout the adjustment range.
Solution Approach 2:
The system incorporates feedback mechanisms through galvanometer drives that precisely control mirror positions based on commanded angles, enabling high adjustment resolution and stable beam positioning through closed-loop control.
3Speed
If manual adjustment methods are used, then the device complexity is low, but the dynamic range and response speed are insufficient
Solution Approach 1:
Manual mechanical adjustment mechanisms are replaced with galvanometer-driven mirror systems that use electromagnetic fields to rotate mirrors rapidly and precisely. This substitution enables high-speed beam repositioning while maintaining fine adjustment resolution through electronic control.
Solution Approach 2:
The adjustment mechanism transitions from static or manually-adjusted mirrors to dynamically controllable mirrors with galvanometer drives, enabling rapid response and high dynamic range in beam positioning while maintaining precision through controlled rotation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise targeting of target materials with micrometer accuracy and microradian angle precision, enhancing the efficiency and stability of EUV radiation generation.
Implementation Method 1
the beam guiding device for supplying the at least one pulsed laser beam from the at least one pulsed laser source into a radiation generation chamber and for the focused irradiation of the target material
Implementation Method 2
utilizing galvanometer drives for high dynamic and angular resolution
Implementation Method 3
at least one pulsed laser source for emitting at least one pulsed laser beam... focused irradiation of the target material with the at least one pulsed laser beam... target material is designed to emit EUV radiation as a result of the irradiation
Implementation Method 4
LPP ('Laser Produced Plasma') process... convert the target material into the plasma state, resulting in the emission of EUV radiation
Data Source
Figure 1
Figure 2a~2c
Figure 3a~3c
AI summary
The invention relates to an EUV light source (1), comprising a providing device (3) for providing a target material (4), at least one pulsed laser source (5, 6) for emitting at least one pulsed laser beam (9, 10), and a beam-guiding device (7) for the feeding of the at least one pulsed laser beam (9, 10) from the at least one pulsed laser source (5, 6) into a radiation generation chamber (2) and for the focused irradiation of the target material (4) with the at least one pulsed laser beam (9, 10) within the radiation generation chamber (2), wherein the target material (4) is designed to emit EUV radiation (11) as a result of the irradiation. The beam-guiding device (7) has, for the adjustment of the spatial position of the at least one pulsed laser beam (9, 10), at least one beam-position adjustment device (14, 15), which comprises four mirrors in the form of two mirror pairs, wherein the four mirrors can be rotated about exactly one axis of rotation each, the axes of rotation of the two mirrors of the first mirror pair being oriented in a first spatial direction and the axes of rotation of the two mirrors of the second mirror pair being oriented in a second spatial direction.