EUV Gas Lock Device Debris Removal via Localized Hydrogen Flow
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Solution Overview
Problem
In EUV light generation systems, debris from the target material can diffuse and accumulate on optical elements, making it difficult to effectively supply hydrogen gas for cleaning, leading to high gas usage and increased costs.
Innovation Solution
A gas lock device with a chamber, optical element, and pipe configuration that ensures debris is removed by directing hydrogen gas flow along the optical element's surface, using a controlled flow rate and chamber design to minimize gas usage and maintain a high Peclet number for effective debris removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If hydrogen gas is supplied at high flow rate to remove debris from optical elements, then debris removal effectiveness is improved, but gas usage increases and running costs increase
Solution Approach 1:
The patent applies local quality by creating a high-velocity gas flow region specifically at the optical element surface where debris removal is needed, rather than uniformly distributing gas throughout the chamber. The gas supply apparatus is positioned to direct flow locally along the optical element surface, concentrating cleaning action where it is most needed while minimizing overall gas consumption.
Solution Approach 2:
The patent changes the flow parameters by maintaining a high Peclet number through controlled gas flow rate and chamber dimension ratios. By optimizing the relationship between gas flow velocity, chamber length, and diffusion coefficient, the system achieves effective debris removal with lower overall gas consumption while maintaining the high-velocity flow needed for cleaning effectiveness.
2Reliability
If chamber size is increased to improve debris removal, then debris removal effectiveness is improved, but device complexity and space requirements increase
Solution Approach 1:
The patent maintains a high Peclet number (Pe = VL/Df) by optimizing the relationship between chamber length (L), gas flow velocity (V), and diffusion coefficient (Df). This allows effective debris removal in a compact chamber by controlling flow parameters rather than simply increasing chamber dimensions. The gas supply apparatus is positioned to create focused high-velocity flow that achieves cleaning effectiveness without requiring a large chamber volume.
3Reliability
If hydrogen gas is supplied to clean optical elements, then debris removal is achieved, but gas flow rate must be high enough to overcome debris diffusion
Solution Approach 1:
The patent concentrates gas flow energy locally at the optical element surface where debris removal is needed, rather than distributing energy uniformly throughout the chamber. The gas supply apparatus directs flow along the optical element surface, creating a high-velocity region that overcomes debris diffusion only where necessary, minimizing overall energy consumption.
Solution Approach 2:
The patent optimizes the Peclet number to balance convection and diffusion effects. By controlling gas flow velocity and chamber dimensions to maintain Pe >> 1, the system achieves effective debris removal with minimum energy input, as the high-velocity flow overcomes diffusion only in the critical region near the optical element rather than throughout the entire chamber.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The gas lock device effectively suppresses debris from reaching optical elements while reducing hydrogen gas flow rate and chamber size, achieving efficient debris removal with lower running costs.
Implementation Method 1
directing hydrogen gas flow along the optical element's surface
Implementation Method 2
maintain a high Peclet number for effective debris removal
Data Source
AI summary
A gas lock device may include a chamber having a passage section and a connection hole that connects a surface to the passage section, an optical element that is attached to the chamber and seals the passage section, a gas supply apparatus, and a pipe that is attached at one end to the gas supply apparatus and attached at the other end to the chamber, and may define a flow channel communicating with the connection hole.