EUV Light Generating Device Gas Lock Nozzle Tilt
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Solution Overview
Problem
Existing extreme ultraviolet (EUV) light generating devices face challenges in maintaining reliability due to issues with tin particle accumulation and the spitting phenomenon, which can lead to mask defects and reduced lithography process reliability.
Innovation Solution
The proposed EUV light generating device includes a vessel with a droplet generator and emitter, a laser light source, a condensing mirror, and gas lock nozzles. The gas lock nozzles are tilted to match the vessel's sidewall angle, creating a downdraft that suppresses backflow and tin accumulation, thereby reducing mask defects and improving device reliability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If gas lock nozzles are arranged perpendicular to the central axis, then the structure is simple and easy to manufacture, but tin particle accumulation and spitting phenomenon occur leading to mask defects
Solution Approach 1:
The gas lock nozzles are arranged asymmetrically with respect to the central axis of the vessel. Specifically, the nozzles are positioned at different radial distances from the central axis, with some nozzles closer and others farther away. This asymmetric arrangement creates non-uniform gas flow patterns that effectively suppress tin particle accumulation and spitting phenomenon, thereby improving lithography process reliability while accepting increased structural complexity
Solution Approach 2:
Different regions of the vessel are addressed with locally optimized gas lock nozzle configurations. The nozzles are positioned at specific locations around the intermediate focus region, with varying angles and distances tailored to local flow requirements. This localized optimization targets specific problem areas where tin particle accumulation and spitting occur, improving reliability without requiring complete redesign of the entire nozzle system
2Reliability
If the number of gas lock nozzles is increased to suppress tin particle accumulation, then reliability improves, but device complexity and cost increase
Solution Approach 1:
Multiple gas lock nozzles are merged into a coordinated system where each nozzle works synergistically with others. The nozzles are positioned and angled to create overlapping gas flow fields that collectively suppress tin particle accumulation and spitting phenomenon. This merging approach achieves improved reliability with a moderate number of nozzles rather than requiring a large number of individually positioned components
Solution Approach 2:
The gas lock nozzles serve multiple functions simultaneously: they generate gas flow to suppress tin particle accumulation, create pressure gradients to prevent spitting phenomenon, and establish stable plasma conditions. This multi-functionality allows a relatively small number of nozzles to achieve multiple objectives, improving reliability without proportionally increasing device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses tin particle accumulation and the spitting phenomenon, leading to improved reliability of the EUV light generating device and the lithography process by reducing mask defects and maintaining consistent EUV light output.
Implementation Method 1
each of the plurality of gas lock nozzles being configured to eject a flow control gas to the internal space of the vessel
Implementation Method 2
the condensing mirror being configured to concentrate EUV light on an intermediate focus (IF)
Implementation Method 3
a laser light source configured to generate a laser beam to generate EUV light by reaction with the droplets in the internal space of the vessel
Data Source
AI summary
An extreme ultraviolet (EUV) light generating device includes a vessel having an internal space, a droplet generator generating droplets to be supplied to the internal space, a droplet emitter emitting the droplets generated by the droplet generator to the internal space, a laser light source generating a laser beam to generate EUV light by reaction with the droplets, a condensing mirror adjacent to the laser light source to at least partially surround the laser light source and concentrating EUV light on an intermediate focus (IF), and gas lock nozzles around the IF to respectively constitute rows and ejecting a flow control gas to the internal space, wherein a tilted direction of a gas lock nozzle in at least one of the rows is tilted in a direction consistent with a tilted direction of a sidewall of the vessel with respect to a central axis direction of the internal space.