EUV Radiation Source Gas Scrubber for Uniform Cleaning
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Solution Overview
Problem
Existing extreme ultraviolet lithography (EUVL) techniques, particularly those using laser-produced plasma (LPP) sources, face challenges in maintaining the cleanliness of the EUV radiation source components, leading to reduced system productivity and collector lifetime due to debris accumulation and non-uniform gas flow distribution.
Innovation Solution
A self-cleaning mechanism is implemented using a gas scrubber with ribs of varying pitches around the EUV radiation source vessel, ensuring uniform cleaning gas flow and effective removal of contaminants from the collector surface, combined with a shielding member to optimize gas flow distribution and debris removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of stationary object
If a gas scrubber is used to clean the EUV radiation source vessel, then the lifetime of collector components is improved, but the device complexity increases
Solution Approach 1:
The gas scrubber system enables self-cleaning of the EUV radiation source vessel by continuously flowing cleaning gas through the chamber to remove debris and contaminants from the collector surface, eliminating the need for manual intervention and extending component lifetime
Solution Approach 2:
The gas scrubber extracts harmful debris and contaminants from the vacuum chamber environment by directing cleaning gas flow across the collector surface, separating contaminants from the optical path and removing them through the gas flow system
2Stability of the object's composition
If ribs with varying pitches are added to the gas scrubber, then gas flow uniformity is improved, but the device complexity increases
Solution Approach 1:
The gas scrubber incorporates ribs with non-uniform pitch distribution, where the pitch varies at different locations around the chamber circumference. This local variation in rib spacing creates regions of different gas flow resistance, ensuring uniform gas flow distribution across the collector surface despite the overall complexity increase
Solution Approach 2:
The rib structure deliberately breaks symmetry by using varying pitches around the circular chamber, creating an asymmetric pattern that optimizes gas flow distribution. This asymmetric design replaces a simpler symmetric rib pattern to achieve more uniform cleaning coverage
3Reliability
If continuous cleaning gas flow is maintained, then debris removal effectiveness is improved, but energy consumption increases
Solution Approach 1:
The gas scrubber system maintains continuous flow of cleaning gas through the EUV radiation source vessel, ensuring uninterrupted removal of debris and contaminants from the collector surface. This continuous action prevents contaminant accumulation and maintains optimal cleaning effectiveness throughout operation
Solution Approach 2:
The system uses pneumatic flow of cleaning gas to transport and remove debris particles from the vacuum chamber. The gas flow acts as a fluid medium that carries contaminants away from the collector surface and out of the chamber, utilizing pneumatic principles for effective debris removal
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the self-cleaning process, increasing the lifetime of the EUV radiation source components and improving the overall productivity of the lithography system by ensuring uniform gas flow and effective debris removal.
Implementation Method 1
a number of gas passages are provided between the ribs. The pitches of the ribs are different from one another around the circumference of the ring structure. The distribution of the cleaning gas flow within the vessel is improved by the gas scrubber
Data Source
AI summary
An extreme ultraviolet radiation source is provided, including a vessel and a gas scrubber. The vessel has a gas inlet from which a cleaning gas is supplied into the vessel and a gas outlet from which the cleaning gas exits the vessel. The gas scrubber is disposed within the vessel, arranged such that the cleaning gas leaves the vessel through the gas outlet after flowing through the gas scrubber. The gas scrubber has a number of gas passages to allow the cleaning gas to flow through, and the sizes of the gas passages vary according to the distance between each of the gas passages and the gas outlet.