EUV Generating Device Acute Gas Supply Angle
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Solution Overview
Problem
Existing EUV light generating devices face challenges in maximizing the intensity of extreme ultraviolet light due to absorption by leftover plasma reaction gas, which reduces the coherence and efficiency of EUV generation.
Innovation Solution
The EUV generating device incorporates a gas cell with a light guide passage and a gas supply passage connected at an acute angle, directing the plasma reaction gas to interact with incident infrared laser pulses to generate EUV light, while minimizing the leftover gas along the EUV light path by releasing it towards the incident portion, thus maintaining high plasma density for generation and low density for emission.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If the plasma reaction gas is supplied to generate EUV light, then the EUV light intensity is improved, but the leftover plasma reaction gas absorbs EUV light and reduces coherence
Solution Approach 1:
The gas cell housing is divided into distinct functional zones: a plasma reaction portion for generating EUV light and an emission portion for outputting the light. The gas supply passage is strategically positioned to supply plasma reaction gas primarily to the plasma reaction portion, creating a spatial segmentation that separates the generation zone from the emission zone. This segmentation allows high plasma density where needed while maintaining low gas density in the emission path, thus resolving the contradiction between intensity generation and coherence preservation.
Solution Approach 2:
Different regions of the gas cell housing are given different gas density characteristics. The plasma reaction portion maintains high plasma reaction gas density to maximize EUV light generation intensity, while the emission portion maintains low gas density to minimize absorption and preserve coherence. The gas supply passage is designed to create this local quality difference by directing gas flow preferentially to the reaction zone.
2Device complexity
If the gas supply passage is connected perpendicular to the light guide passage, then the structure is simple, but the plasma reaction gas flows along the EUV light path and increases absorption
Solution Approach 1:
The gas supply passage is connected to the gas cell housing at an acute angle (specifically 45 degrees) relative to the light guide passage, rather than perpendicular. This asymmetric connection angle causes the plasma reaction gas to flow in a direction that does not coincide with the EUV light propagation path. The gas flows from the supply passage into the plasma reaction portion and is directed toward the incident portion, creating an asymmetric flow pattern that avoids the emission path and reduces absorption losses.
3Productivity
If high plasma density is maintained throughout the light guide passage, then EUV generation efficiency is improved, but reabsorption by leftover gas increases
Solution Approach 1:
The invention extracts or removes the harmful effect of leftover plasma reaction gas from the EUV light path. By positioning the gas supply passage to supply gas at an acute angle and directing flow toward the incident portion, the system effectively removes gas molecules from the emission path between the plasma reaction portion and the output. This extraction of gas from the critical emission zone prevents reabsorption while maintaining high plasma density in the generation zone.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the intensity and coherence of EUV light by reducing reabsorption, maximizing the EUV light intensity and maintaining a high degree of vacuum to prevent extinction, thereby improving the overall efficiency of EUV generation.
Implementation Method 1
High harmonic generation (HHG) applies a high time-varying electric field to an inert gas, e.g., argon (Ar), neon (Ne), or xenon (Xe), so that electrons are ionized and recombine to generate EUV light.
Implementation Method 2
High harmonic generation (HHG) applies a high time-varying electric field to an inert gas, e.g., argon (Ar), neon (Ne), or xenon (Xe), so that electrons are ionized and recombine to generate EUV light.
Data Source
AI summary
An extreme ultraviolet (EUV) generating device is provided. The EUV generating device includes a gas cell housing extending in a first direction, a light guide passage extending through the gas cell housing in the first direction, and a gas supply passage to supply a plasma reaction gas. The light guide passage includes an incident portion to receive incident light, a plasma reaction portion, extending from the incident portion in the first direction to generate EUV light due to a reaction between the incident light and the plasma reaction gas, and an emission portion, extending from the plasma reaction portion in the first direction, to emit the EUV light in the first direction. The gas supply passage may be connected to the plasma reaction portion at a side of the gas cell housing and may be inclined at an acute angle with respect to the first direction.