EUV Light Generation Gas Supply Trajectory Stabilization
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Solution Overview
Problem
In EUV light generation systems, the gas supplied to remove debris around the EUV collector mirror can divert the target from its intended trajectory, preventing it from reaching the plasma generation region, which is critical for generating extreme ultraviolet light for microfabrication at 32 nm or less.
Innovation Solution
A first gas supply unit is configured to blow out gas along the trajectory of the target, specifically in a direction that includes a -Z and Y component, to stabilize the target's path and ensure it reaches the plasma generation region, using a nozzle to control the flow rate and direction of the gas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-generated harmful factors
If gas is supplied to remove debris around the EUV collector mirror, then the mirror surface is cleaned, but the target trajectory is diverted and the target cannot reach the plasma generation region
Solution Approach 1:
The gas supply system is segmented into multiple regions: a first gas supply unit supplies gas toward the target trajectory to prevent debris accumulation, while a second gas supply unit supplies gas toward the EUV collector mirror to remove debris. This segmentation allows independent control of gas flow in different regions, enabling simultaneous protection of target trajectory and cleaning of the mirror surface.
Solution Approach 2:
A partition wall is introduced as an intermediary structure between the target trajectory region and the EUV collector mirror region. The partition wall has a through-hole that allows the target to pass through while blocking gas flow from the second gas supply unit from directly affecting the target trajectory. This intermediary structure mediates between the need for debris removal and the need to maintain stable target transport.
2Productivity
If gas flow rate is increased to improve debris removal efficiency, then debris is removed more effectively, but target trajectory stability deteriorates
Solution Approach 1:
The gas supply is segmented into two independent systems with different flow rates and directions. The first gas supply unit operates at a lower flow rate along the target trajectory to maintain stability, while the second gas supply unit operates at a higher flow rate toward the EUV collector mirror to maximize debris removal efficiency. This segmentation resolves the contradiction by allowing each subsystem to be optimized for its specific function.
Solution Approach 2:
Different gas flow conditions are applied to different spatial locations: along the target trajectory, gas flow is kept gentle and stable to maintain trajectory; toward the EUV collector mirror, gas flow is intensified to improve debris removal. This local differentiation of gas flow quality allows simultaneous optimization of trajectory stability and debris removal efficiency in different regions.
Data Source
AI summary
An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.