EUV Generation Device Preionization and Electromagnetic Focusing
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Solution Overview
Problem
Existing EUV generation devices face challenges in achieving adequate output intensity and emitting efficiency for EUV rays due to low energy intensity of the plasma gas generated, which is insufficient for semiconductor processes like photolithography.
Innovation Solution
An EUV generation device that preionizes a plasma gas using a radio frequency (RF) power supply before directing lasers into a laser focal area, enhancing plasma generation efficiency and output intensity by focusing preionized plasma gas with an electromagnet, thereby improving EUV ray emission efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If plasma gas is generated using lasers directly, then the generation process is simple, but the energy intensity of the plasma gas is low and EUV ray output intensity is insufficient
Solution Approach 1:
The RF power supply device performs preionization of the plasma gas before it reaches the laser focal area. This preliminary action creates a preionized plasma gas that has higher energy intensity and responds more efficiently to laser irradiation, thereby increasing EUV ray output without fundamentally changing the overall device structure
Solution Approach 2:
The invention changes the ionization state parameter of the plasma gas from neutral to preionized by applying RF power. This parameter change enables the plasma gas to achieve higher energy intensity and improve EUV generation efficiency while maintaining a relatively simple device configuration
2Illumination intensity
If plasma gas energy intensity is increased to improve EUV output, then EUV ray intensity improves, but the process becomes more complex
Solution Approach 1:
By preionizing the plasma gas before laser interaction, the system achieves higher plasma energy intensity and EUV output without requiring complex real-time control mechanisms during the laser irradiation phase
Solution Approach 2:
The RF power supply device acts as an intermediary that prepares the plasma gas in advance, creating optimal conditions for subsequent laser-plasma interaction and EUV generation, thereby simplifying the overall process control
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution significantly increases the output intensity and emission efficiency of EUV rays, making them more suitable for semiconductor processes such as light exposure and inspection, by effectively generating preionized plasma and focusing it using an electromagnet.
Implementation Method 1
a radio frequency (RF) power supply device configured to preionize the plasma gas before the plasma gas flows into the laser focal area
Implementation Method 2
a laser source configured to emit lasers toward the inside of the housing body through the window
Implementation Method 3
a plasma generation device inside the housing body, the plasma generation device configured to generate plasma in response to the lasers being emitted toward a plasma gas flowing into a laser focal area
Implementation Method 4
an electromagnet configured to focus the preionized plasma gas to the laser focal area
Data Source
AI summary
An extreme ultraviolet (EUV) generation device includes a housing module including a housing body whose inside is maintained in a vacuum state and an exit window formed on one side of the housing body, a laser source which emits lasers toward the inside of the housing body through the exit window, a plasma generation module which is located inside the housing body and generates plasma by allowing the lasers to be emitted toward a plasma gas, which flows into a laser focal area, and a radio frequency (RF) power supply module which preionizes the plasma gas before the plasma gas flows into the laser focal area.