EUV Lithography Optical Component Heating System
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Solution Overview
Problem
In lithographic apparatuses using EUV radiation, dynamic heat loads on optical components vary with radiation on/off cycles, leading to position deviations and pattern errors due to inconsistent heat reflection, affecting the accuracy of pattern formation on substrates.
Innovation Solution
A system with a heating radiation source that adjusts the properties of emitted radiation, such as polarization, intensity, or wavelength, to maintain a constant reflected heat load on optical components during EUV radiation exposure, using configurations that differ based on the presence or absence of EUV radiation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If the heating of optical components is varied depending on whether EUV radiation is turned on or off, then the heat load on the optical components can be kept constant, but the reflected heat onto other components varies, leading to dynamic heat loads and position deviations
Solution Approach 1:
The patent changes the properties of heating radiation (wavelength, polarization, intensity) to control the reflection characteristics of the optical component. By adjusting these parameters, the system maintains constant heat load on the optical component while minimizing reflected heat to other components, thereby resolving the contradiction between temperature control and position stability.
Solution Approach 2:
The system uses feedback control to monitor the heat load and reflected heat, and adjusts the heating radiation parameters accordingly. This feedback mechanism ensures that the optical component maintains stable temperature and position, resolving the contradiction by dynamically balancing heat absorption and reflection.
2Reliability
If the heating radiation properties are varied to maintain constant reflected heat, then position deviations are reduced, but the system complexity increases
Solution Approach 1:
Instead of adding complex hardware, the patent resolves the contradiction by changing the parameters of existing heating radiation (wavelength, polarization, intensity). This approach maintains position stability while avoiding significant increases in device complexity, as the same heating system can operate in different parameter modes.
3Manufacturing precision
If different heating configurations are used based on EUV radiation presence, then pattern accuracy is improved, but the operation complexity increases
Solution Approach 1:
The patent implements dynamic operation modes where the heating radiation properties are automatically adjusted based on the presence or absence of EUV radiation. This dynamic adaptation improves pattern accuracy while the automation of parameter changes reduces operational complexity, as the system self-adjusts without requiring manual intervention for each mode change.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach stabilizes the heat load on optical components and surrounding structures, reducing position deviations and pattern errors, thereby enhancing the accuracy and reliability of pattern formation on substrates.
Implementation Method 1
a portion of the heating radiation being absorbed by the optical component and another portion of the heating radiation being reflected by optical component
Implementation Method 2
another portion of the heating radiation being reflected by optical component
Implementation Method 3
The property may comprise at least one of the following: a polarisation, polarisation state, intensity, power and wavelength of the heating radiation
Data Source
AI summary
A system for heating an optical component of a lithographic apparatus, the system comprising a heating radiation source, the heating radiation source being configured to emit heating radiation for heating of the optical component, wherein the system is configured to direct the heating radiation emitted by the heating radiation source onto the optical component, a portion of the heating radiation being absorbed by the optical component and another portion of the heating radiation being reflected by optical component, and wherein the system is configured to vary or change a property of the heating radiation emitted by the heating radiation source such that the other portion of the heating radiation that is reflected by the optical component is constant during operation of the lithographic apparatus.