EUV Radiation Generating Device Intermediate Chamber Leak Detection
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Solution Overview
Problem
EUV radiation generating devices face operational reliability issues due to potential leaks in the windows of the vacuum and beam guidance chambers, which can lead to contamination of optical elements and system failure, especially when the target material vaporizes and deposits on these surfaces.
Innovation Solution
Incorporating an intermediate chamber with a supply device for a test gas and a leakage monitoring system, using a secondary window in series with the primary window to contain gas flow in case of a leak, and employing a throttle and pressure sensors to detect pressure differences and gas flow, thereby preventing contamination and enhancing operational reliability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If windows are used to seal chambers, then gas-tight sealing is achieved, but leaks can occur leading to contamination and system failure
Solution Approach 1:
The vacuum system is divided into multiple sealed chambers (first vacuum chamber, second vacuum chamber, intermediate chamber) separated by windows. This segmentation contains potential leaks within specific chambers, preventing contamination from spreading throughout the entire system. The intermediate chamber acts as a buffer zone that isolates the target material vapor from the illumination and projection systems.
Solution Approach 2:
A test gas supply device is installed in the intermediate chamber to perform preliminary leak detection before contamination can spread. The leakage monitoring device detects leaks early by monitoring pressure changes or using mass spectrometry, allowing preventive maintenance before target material vapor contaminates the optical elements.
2Reliability
If windows are made robust to prevent leaks, then sealing reliability improves, but complexity of the sealing system increases
Solution Approach 1:
Instead of using a single complex window sealing system, the patent divides the system into multiple simpler windows (first window, second window, third window) sealing separate chambers. Each window can be independently designed and replaced, reducing the complexity of individual sealing components while maintaining overall reliability.
Solution Approach 2:
The intermediate chamber with its own window (second window) acts as an intermediary buffer between the target material region and the illumination/projection systems. This intermediate sealing layer provides an additional barrier against contamination without requiring the primary windows to be excessively robust, thus balancing sealing reliability with system complexity.
3Device complexity
If a single window is used to seal a chamber, then device complexity is reduced, but a single leak can cause widespread contamination
Solution Approach 1:
The patent uses multiple windows to divide the vacuum system into separate chambers. If one window leaks, only the specific chamber it seals becomes contaminated, not the entire system. The intermediate chamber with the second window creates an isolation barrier that prevents target material vapor from reaching the illumination and projection systems even if the first window leaks.
Solution Approach 2:
The intermediate chamber serves as a cushioning barrier between potential leak sources and critical optical components. Even if leaks occur in the first window, the intermediate chamber with its own sealing (second window) provides a protective buffer zone, preventing widespread contamination and allowing the system to maintain operation with localized damage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution significantly increases the operational reliability of the EUV radiation generating device by minimizing contamination and allowing for early detection and mitigation of leaks, reducing the risk of system failure and maintaining the cleanliness of the illumination and projection systems.
Implementation Method 1
a leakage monitoring device for monitoring a leak in the intermediate chamber using the supplied test gas
Data Source
AI summary
The invention relates to an EUV radiation generating device (1), comprising: a vacuum chamber (4), in which a target material (12) can be arranged in a target position (Z) in order to generate EUV radiation (14), and a beam guiding chamber (3) for guiding a laser beam (5) from a driver laser device (2) towards the target position (Z). The EUV radiation generating device (1) comprises an intermediate chamber (18), which is arranged between the vacuum chamber (4) and the beam guiding chamber (3), a first window (19), which seals the intermediate chamber (18) off to gas and which allows the laser beam (5) to enter from the beam guiding chamber (3), and a second window (20), which seals the intermediate chamber (18) off to gas and which allows the laser beam (5) to escape into the vacuum chamber (4). The invention also relates to a method for operating the EUV radiation generating device (1).