EUV Laser Wave Front Compensation via Deformable Mirror

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Solution Overview

Problem

High-power laser beams used in extreme ultraviolet light source devices experience wave front distortion due to thermal effects, leading to inefficient amplification and irradiation, resulting in reduced EUV radiation power.

Innovation Solution

An extreme ultraviolet light source device with a detection and compensation system that adjusts the direction and shape of the laser beam to a predetermined state using multiple compensation units and sensors, ensuring efficient amplification and irradiation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If high-power laser beam is used to generate EUV radiation, then EUV radiation power is improved, but wave front distortion occurs due to thermal effects

Engineering Contradiction:
ImproveEUV radiation powerVSAvoidwave front stability
Core Design Contradiction:
PowerVSStability of the object's composition

Solution Approach 1:

The patent applies preliminary action by measuring the wave front of the laser beam before it is input into the amplification area using a wave front sensor, and then correcting the measured wave front using a deformable mirror. This pre-correction prevents thermal distortion from degrading the beam quality before amplification, thereby maintaining stable wave front characteristics while enabling high-power EUV radiation generation.

Inventive Principle:
Principle #10Preliminary action

2Productivity

If high-power laser beam is used, then amplification efficiency is improved, but thermal distortion changes the shape and direction of wave front

Engineering Contradiction:
Improveamplification efficiencyVSAvoidwave front shape
Core Design Contradiction:
ProductivityVSShape

Solution Approach 1:

The patent implements feedback control by using a wave front sensor to continuously measure the actual wave front of the laser beam, comparing it with the desired wave front, and then using a deformable mirror to correct the deviations. This closed-loop feedback system ensures that thermal distortion does not degrade amplification efficiency while maintaining the required wave front shape for optimal performance.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent replaces traditional mechanical wave front correction methods with a deformable mirror that uses electro-active polymers or piezoelectric actuators to dynamically adjust the mirror surface shape. This substitution enables precise, rapid, and automated wave front correction in response to thermal distortion, maintaining amplification efficiency without mechanical complexity.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Power

If high-power laser beam is used, then EUV radiation output is improved, but focusing performance deteriorates due to wave front change

Engineering Contradiction:
ImproveEUV radiation outputVSAvoidfocusing precision
Core Design Contradiction:
PowerVSManufacturing precision

Solution Approach 1:

The patent applies preliminary action by measuring the wave front before the laser beam enters the amplification area and correcting it using a deformable mirror. This pre-correction ensures that the beam maintains its intended focusing characteristics throughout the optical path, preventing thermal distortion from degrading focusing precision while enabling high-power EUV radiation output.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Stabilizes the output characteristics of the laser beam, maintaining high-power EUV radiation generation by compensating for wave front distortions, thereby improving the focusing performance and power of the EUV radiation.

Implementation Method 1

an LPP (Laser Produced Plasma: plasma produced by a laser) type light source, which generates a plasma by irradiating laser beam on a target material, and employs EUV radiation emitted from this plasma

Methodology Applied
Scientific EffectLaser-produced plasma: Plasma

Implementation Method 2

The use of such high-power laser beam causes various optical elements in the optical path to absorb radiation and thus become hot

Methodology Applied
Scientific EffectRadiation absorption: Absorption (EM radiation)

Implementation Method 3

When high-power laser beam passes through a lens or a window, the shape and refractive index of the lens or window vary due to a heat-originated temperature increase, changing the wave front of laser beam

Methodology Applied
Scientific EffectThermal lensing: Thermal Expansion

Data Source

PatentUS8698114B2Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source, and method of adjusting laser light source device for extreme ultraviolet light source device
Publication Date: 2014.04.15 GIGAPHOTON INC
  • US8698114B2 patent drawing
  • US8698114B2 patent drawing
  • US8698114B2 patent drawing

AI summary

An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.