EUV Light Generation Control via Laser Beam Image Feedback
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Solution Overview
Problem
Current semiconductor production processes face challenges in generating extreme ultraviolet (EUV) light with sufficient precision and efficiency for microfabrication feature sizes of 32 nm or less, particularly in aligning the target position and laser beam focus for optimal EUV light generation.
Innovation Solution
The system incorporates a laser apparatus, a chamber with a window, a target supply unit, a laser beam focusing optical system, a detector for image detection, and a controller to adjust the target position and laser beam focus based on detected images, enabling precise control of the EUV light generation process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a laser beam focusing optical system is used to focus the laser beam, then the EUV light generation precision is improved, but the system complexity increases
Solution Approach 1:
The patent employs a detector to capture images of the laser beam and target position, feeds this information back to a control unit, which then adjusts the focusing optical system and target supply unit to optimize EUV light generation. This closed-loop feedback mechanism enables high precision control without requiring overly complex mechanical structures.
Solution Approach 2:
The patent replaces complex mechanical positioning systems with a combination of optical focusing and image-based detection. Instead of using purely mechanical methods to achieve precise alignment, the system uses optical fields (laser beam focusing) and electronic control based on detected images, thereby reducing mechanical complexity while maintaining or improving precision.
2Measurement precision
If image detection is implemented to control target position and laser focus, then the control precision is improved, but the device complexity increases
Solution Approach 1:
The detector captures images of the laser beam and target position, providing real-time feedback to the control unit. This feedback loop enables precise measurement and control of the EUV light generation parameters without requiring complex mechanical measurement systems.
Solution Approach 2:
The patent introduces an image detector as an intermediary between the physical system (laser beam and target) and the control system. This intermediary converts physical parameters into detectable images, enabling precise measurement and control while keeping the control logic relatively simple and modular.
3Productivity
If the target position and laser beam focus are precisely aligned, then the EUV light generation efficiency is improved, but the adjustment mechanism complexity increases
Solution Approach 1:
The control unit uses images from the detector to continuously monitor and adjust the target position and laser beam focus alignment. This feedback-driven adjustment ensures optimal EUV light generation efficiency while using relatively simple adjustment mechanisms controlled by electronic signals rather than complex mechanical systems.
Solution Approach 2:
The system enables self-adjustment of the target position and laser focus through the feedback loop. The control unit automatically processes detector images and makes necessary adjustments without requiring complex manual intervention or overly sophisticated adjustment mechanisms, thereby improving efficiency while keeping the adjustment system relatively simple.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for high-precision control of the EUV light generation position, improving the accuracy and efficiency of EUV light production for advanced semiconductor manufacturing.
Implementation Method 1
a laser apparatus configured to output a laser beam
Implementation Method 2
a laser beam focusing optical system positioned to reflect the laser beam toward a predetermined position inside the chamber
Implementation Method 3
a laser beam focusing optical system positioned to reflect the laser beam toward a predetermined position inside the chamber
Implementation Method 4
a LPP (Laser Produced Plasma) type system in which plasma is generated by irradiating a target material with a laser beam
Data Source
AI summary
Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result.