EUV Light Source Optical Element Deterioration Detection

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Solution Overview

Problem

The EUV light source apparatus faces challenges in rapidly detecting and responding to deteriorations in windows and laser beam focusing optics within the EUV light generation chamber, leading to reduced EUV light generation efficiency and instability in plasma generation due to debris accumulation and focusing position shifts.

Innovation Solution

Incorporating a laser beam detector outside the EUV light generation chamber to monitor the intensity of the laser beam after it has passed through the chamber, and a processing unit to assess the deterioration of optical elements based on detected intensity, allowing for timely notification and potential replacement of deteriorated components.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of time

If a laser beam detector and processing unit are added to monitor laser beam intensity, then detection speed and response time improve, but device complexity increases

Engineering Contradiction:
Improvedetection response timeVSAvoidsystem complexity
Core Design Contradiction:
Loss of timeVSDevice complexity

Solution Approach 1:

The laser beam detector continuously monitors the laser beam intensity before plasma generation occurs, enabling early detection of optical element deterioration. This preliminary monitoring allows the system to identify degradation trends and alert operators before actual plasma generation is affected, reducing downtime while adding only essential detection components.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If optical elements are monitored continuously, then reliability improves, but use of energy increases

Engineering Contradiction:
Improvesystem reliabilityVSAvoidenergy consumption
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The processing unit analyzes laser beam intensity data from the detector and provides feedback about the condition of optical elements. This feedback mechanism enables continuous monitoring without requiring additional energy-intensive active sensing during plasma generation, as the system reusesthe existing laser beam signal for diagnostic purposes.

Inventive Principle:
Principle #23Feedback

3Productivity

If optical elements are replaced proactively, then productivity is maintained, but loss of time for maintenance increases

Engineering Contradiction:
ImproveEUV light generation efficiencyVSAvoidmaintenance downtime
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The system detects optical element deterioration trends before they critically impact plasma generation efficiency. By providing advance warning, the system allows operators to schedule maintenance during planned downtime rather than experiencing unexpected interruptions, thereby maintaining productivity while optimizing maintenance timing.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables rapid detection and notification of optical element deterioration, facilitating prompt action to maintain EUV light generation efficiency and stability, thereby preventing unnecessary downtime and extending the lifespan of critical components.

Implementation Method 1

a laser beam detector provided outside the extreme ultraviolet light generation chamber (102), and for detecting an intensity of the laser beam diffused without being applied to the target material after being focused by the laser beam focusing optics (104), and being emitted from the extreme ultraviolet light generation chamber (102)

Methodology Applied
Scientific EffectLight detection: Photoelectric Effect

Implementation Method 2

a laser beam focusing optics (104) for focusing the laser beam emitted from the driver laser (101) onto a path of the target material injected into the extreme ultraviolet light generation chamber (102)

Methodology Applied
Scientific EffectOptical focusing: Focusing

Implementation Method 3

a driver laser (101) for emitting the laser beam

Methodology Applied
Scientific EffectLaser emission: Laser

Implementation Method 4

for generating extreme ultraviolet light from plasma by applying a laser beam to a target material and thereby turning the target material into plasma

Methodology Applied
Scientific EffectLaser ablation: Laser Ablation

Implementation Method 5

turning the target material into plasma

Methodology Applied
Scientific EffectIonization: Ionisation

Data Source

PatentUS8294129B2Extreme ultraviolet light source apparatus
Publication Date: 2012.10.23 GIGAPHOTON INC
  • US8294129B2 patent drawing
  • US8294129B2 patent drawing
  • US8294129B2 patent drawing

AI summary

An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.