EUV Light Source Droplet Blocking Unit
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Solution Overview
Problem
Existing EUV light source devices face challenges in maintaining a high degree of vacuum and cleanness in the plasma generation chamber due to unwanted droplets and evaporation, leading to reduced EUV light output and contamination of components.
Innovation Solution
The implementation of a droplet blocking unit that selectively blocks non-irradiated droplets from entering the plasma generation chamber, using a piezoelectric element and control unit to synchronize the droplet generation and laser irradiation frequencies, thereby improving the vacuum and cleanness within the chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If droplet generation frequency is increased to improve laser irradiation efficiency, then more droplets are available for EUV generation, but unwanted droplets increase contamination in the plasma generation chamber
Solution Approach 1:
The blocking means performs preliminary action by intercepting and removing unwanted droplets before they enter the plasma generation chamber. The blocking means is positioned in the droplet path and operates in advance to prevent contamination, allowing the droplet generation frequency to be increased without proportionally increasing contamination levels.
Solution Approach 2:
The blocking means extracts unwanted droplets from the droplet stream generated by the droplet generating means. By selectively removing only the unwanted droplets while allowing irradiated droplets to pass through, the system maintains high productivity while reducing contamination in the plasma generation chamber.
2Reliability
If vacuum pump capacity is increased to maintain higher vacuum degree, then chamber cleanness is improved, but device complexity and cost increase
Solution Approach 1:
Instead of relying solely on a more powerful vacuum pump to remove all contamination, the blocking means extracts unwanted droplets at the source. This reduces the burden on the vacuum pump, allowing maintenance of high vacuum degree with a moderately sized pump, thereby reducing device complexity.
Solution Approach 2:
The blocking means acts as an intermediary component between the droplet generating means and the plasma generation chamber. It mediates the droplet flow by selectively blocking unwanted droplets, reducing the workload on the vacuum pump and simplifying the overall vacuum system design.
3Object-generated harmful factors
If blocking means is added to prevent droplet contamination, then chamber cleanness is improved, but device complexity increases
Solution Approach 1:
The system is segmented into distinct functional zones: droplet generation area, blocking means area, and plasma generation chamber. The blocking means is positioned as a separate component that can be independently controlled, allowing it to address contamination without requiring fundamental redesign of the entire chamber structure.
Solution Approach 2:
The blocking means is designed with controllable positioning capability, allowing it to dynamically adjust its blocking action based on operational requirements. This dynamic characteristic enables the system to maintain simplicity by activating the blocking function only when needed, rather than requiring a permanently complex fixed structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the generation efficiency of extreme ultra-violet light by maintaining a higher degree of vacuum and cleanness in the plasma generation chamber, reducing contamination and improving the overall performance of the EUV light source device.
Implementation Method 1
piezoelectric element and control unit to synchronize the droplet generation and laser irradiation frequencies
Implementation Method 2
a laser beam emitted from a laser light source to turn the target material into a plasma state
Implementation Method 3
turn the target material into a plasma state to emit the EUV light
Implementation Method 4
maintaining a higher degree of vacuum and cleanness in the plasma generation chamber
Data Source
AI summary
An EUV (extreme ultra violet) light source device in which a degree of vacuum or cleanness in a plasma generation chamber is improved while the construction is simplified. The device includes a first chamber; a second chamber connected to the first chamber through an opening portion; a target supplier that supplies a target material into the first chamber; a droplet generating unit that generates droplets of the target material of molten metal repetitively dropping based on the target material supplied by the target supplier; a blocking unit that prevents the droplets of the target material generated by the droplet generating unit from passing through the opening portion; control unit that controls the blocking unit to operate at predetermined timing; a laser light source; and an optical system that leads a laser beam to the droplets of the target material introduced into the second chamber.