EUV Light Source Spray Nozzle Array and Laser Bombardment
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Solution Overview
Problem
Current EUV light sources for photolithography have low power output, which is insufficient for meeting the requirements of advanced semiconductor manufacturing, due to limitations in the generation and focusing of EUV light, leading to impaired bombardment effects and reduced EUV light accumulation.
Innovation Solution
An EUV light source with a spray nozzle array and a laser system using multiple reflective mirrors to sequentially bombard droplets, increasing the number of droplets bombarded and using rotating focusing mirrors to collect and focus EUV light at a central point, thereby enhancing the power output.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If a single spray nozzle and single laser beam are used, then the device complexity is low, but the EUV light power output is insufficient
Solution Approach 1:
The patent divides the droplet generation system into multiple spray nozzles arranged in arrays, where each nozzle sprays droplets sequentially. This segmentation allows multiple droplets to be bombarded by laser beams in sequence, accumulating EUV light power while keeping each individual nozzle relatively simple
Solution Approach 2:
The patent implements continuous droplet spraying and sequential laser bombardment to maintain continuous EUV light generation. The spray nozzles and laser beams operate in a coordinated continuous manner, ensuring uninterrupted EUV light output for photolithography processes
2Quantity of substance
If the laser beam bombardment is limited to a single position, then the system is simple, but the number of droplets bombarded is limited
Solution Approach 1:
The patent transitions from a single-point laser bombardment to a multi-position scanning system. The laser beam is moved across multiple spatial positions to bombard droplets at different locations, effectively increasing the quantity of droplets processed without significantly complicating the fundamental bombardment mechanism
3Power
If EUV light is not effectively focused, then the system is simple, but the EUV light accumulation is reduced
Solution Approach 1:
The patent combines multiple EUV light sources generated from different droplet bombardment events into a single focused point. The focusing system merges the EUV photons accumulated from sequential droplet interactions, concentrating the total energy at one location for effective photolithography exposure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution significantly increases the power of the EUV light focused at the central point, addressing the low power output issues of existing EUV light sources and enabling more efficient photolithography processes.
Implementation Method 1
a spray nozzle array having a plurality of spray nozzles configured to spray a plurality of rows of droplets to an irradiating position
Implementation Method 2
a laser source having a first reflective mirror and a second reflective mirror configured to generate a first laser beam and a second laser beam
Implementation Method 3
The laser beam 104 is focused by the lens unit 105; and bombards the Sn droplets 102. The bombarded Sn droplets 102 generates plasma; and the plasma radiates ultraviolet light.
Implementation Method 4
the plasma radiates ultraviolet light
Implementation Method 5
a laser source having a first reflective mirror and a second reflective mirror configured to generate a first laser beam and a second laser beam, and to cause the first laser beam and the second laser beam to sequentially bombard the plurality of droplets
Implementation Method 6
a light focusing device comprising a first partial focusing mirror and a second partial focusing mirror configured to perform a rotating scanning to collect EUV light and focus the collected EUV light at a central focusing point
Data Source
AI summary
An extreme ultraviolet (EUV) light source is provided. The EUV light source comprises a spray nozzle array having a plurality of spray nozzles configured to spray a plurality of rows of droplets to an irradiating position. The EUV light source also includes a laser source having a first reflective mirror and a second reflective mirror configured to generate a first laser beam and a second laser beam, and to cause the first laser beam and the second laser beam to sequentially bombard the plurality of droplets arriving at the irritating position to generate EUV light with increased output power. Further, the EUV light source includes a light focusing device a light focusing device comprising a first partial focusing mirror and a second partial focusing mirror configured to perform a rotating scanning to collect EUV light and focus the collected EUV light at a central focusing point.