Electric Field-Assisted EUV Lithography for Dose Reduction
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Solution Overview
Problem
Extreme ultraviolet (EUV) lithography for semiconductor processing is costly due to the high cost per photon, necessitating dose reduction in the patterning process.
Innovation Solution
The system comprises an electromagnetic radiation source, an optical assembly, and an exposure chamber with a substrate support and an electrode assembly that applies an electric field to an EM-sensitive layer on the semiconductor substrate during exposure to EUV radiation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If EUV lithography is used for semiconductor patterning, then manufacturing precision is improved, but cost increases due to high cost per photon
Solution Approach 1:
The patent applies an external electric field to the resist material during EUV exposure, changing the physical parameters of the resist to enhance secondary electron generation and improve patterning efficiency, thereby reducing the effective dose requirement and manufacturing cost
2Manufacturing precision
If higher EUV dose is applied to ensure full exposure, then manufacturing precision is maintained, but productivity decreases due to increased cost and time
Solution Approach 1:
The electric field is applied during the exposure process to pre-enhance secondary electron generation before the chemical changes in the resist occur, making the exposure process more efficient and reducing the total dose needed for complete patterning
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The application of an electric field enhances secondary electron generation, potentially reducing the EUV dose required for substrate patterning, thereby lowering costs and improving efficiency in semiconductor processing.
Implementation Method 1
the electric field enhances secondary electron generation while exposing the substrate to EM radiation
Data Source
AI summary
Lithographical systems and methods. Embodiments of methods disclosed herein comprise exposing a substrate to an electric field while exposing the substrate to electromagnetic radiation. Thus, dose reduction can be obtained.