EUV Lithography Sensor Frame Gap Measurement
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Solution Overview
Problem
In EUV lithography apparatuses, determining the width of the gap between the supporting frame and the sensor frame is crucial to prevent mechanical short circuits, which can disturb the dynamic behavior of the projection lens, and existing methods are either invasive or complex, such as using feeler gauges or air pressure measurements.
Innovation Solution
An optical device with a sensor arrangement that includes a contact element and a contact surface, which determines the gap width non-contactually and functions as an end stop, integrating gap measurement and movement limitation, using capacitive, inductive, or optical methods to ensure accurate and reliable gap determination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If feeler gauges or air pressure measurement methods are used to determine gap width, then measurement capability is provided, but structural complexity and component count increase
Solution Approach 1:
The patent combines the measurement function and end stop function into a single integrated component. The measurement mark is directly formed on the end stop structure itself, eliminating the need for separate measurement devices like feeler gauges or air pressure measurement systems. This merging reduces structural complexity while maintaining measurement capability.
Solution Approach 2:
The end stop structure serves multiple functions simultaneously: it provides mechanical support, limits relative movement between frames, and enables gap width measurement. The measurement mark integrated into the end stop allows the same structure to serve both protective and measurement purposes, reducing the need for additional components.
2Measurement precision
If invasive measurement methods are used, then gap width can be determined, but risk of mechanical damage increases
Solution Approach 1:
The measurement mark is pre-formed on the end stop structure during manufacturing, eliminating the need for invasive insertion of measurement tools during operation. The gap width can be determined by non-contact optical measurement of the measurement mark position, preventing mechanical damage to the frames while enabling accurate measurement.
3Ease of operation
If separate measurement and end stop components are used, then functional clarity is maintained, but device complexity increases
Solution Approach 1:
The patent integrates the measurement mark directly into the end stop structure, combining what could be separate components into a unified element. This reduces the component count and simplifies the overall device structure while maintaining clear functional differentiation through the design of the measurement mark on the end stop.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for reliable and non-invasive determination of the gap width, preventing mechanical short circuits and ensuring the functionality of the lithography apparatus, while reducing structural complexity and component count.
Implementation Method 1
using capacitive, inductive, or optical methods to ensure accurate and reliable gap determination
Implementation Method 2
using capacitive, inductive, or optical methods to ensure accurate and reliable gap determination
Implementation Method 3
using capacitive, inductive, or optical methods to ensure accurate and reliable gap determination
Data Source
AI summary
The disclosure relates to an optical device for a lithography system, including an optical element, a supporting frame supporting the optical element, a sensor frame mechanically decoupled from the supporting frame, wherein a gap is provided between the supporting frame and the sensor frame, and a sensor assembly designed to determine a width of the gap in a contactless manner. The sensor assembly has a contact element and a contact surface. The contact element is designed to contact the contact surface to limit relative motion of the supporting frame relative to the sensor frame.