EUV Lithography Vane Bucket Module for Collector Debris Control
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Solution Overview
Problem
The accumulation of debris on the collector surface in extreme ultraviolet (EUV) lithography systems compromises the reflectivity of the collector, leading to reduced efficiency and lifetime of the system.
Innovation Solution
A vane bucket module with a collecting tank and temperature adjusting pack is used to collect and manage debris, featuring a cover with strategically designed through holes and a temperature control mechanism to prevent debris solidification and accumulation, ensuring continuous reflectivity and extended collector lifetime.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If debris is collected using conventional methods, then debris accumulation is reduced, but the collector reflectivity deteriorates over time and system lifetime is limited
Solution Approach 1:
The patent applies parameter changes by controlling the temperature of the collector surface to prevent debris solidification. By maintaining the collector at elevated temperatures (above the melting point of debris materials), the debris remains in a molten or semi-molten state, preventing accumulation and maintaining reflectivity. This thermal parameter control directly addresses both the reliability (reflectivity) and duration (lifetime) concerns.
Solution Approach 2:
The patent utilizes phase transitions by exploiting the melting and solidification behavior of debris materials. The collector is heated to keep debris in a liquid or semi-liquid state where it can be easily removed, and then allowed to cool in controlled zones where it solidifies into removable deposits. This phase transition approach enables continuous operation and extends collector lifetime while maintaining reflectivity.
2Reliability
If temperature is increased to prevent debris solidification, then debris accumulation is reduced, but energy consumption increases
Solution Approach 1:
The patent applies segmentation by dividing the collector surface into multiple temperature zones with different thermal characteristics. Different regions of the collector are maintained at different temperatures - some zones are heated to prevent debris solidification and facilitate removal, while other zones are allowed to cool for controlled solidification. This segmented approach reduces overall energy consumption compared to heating the entire collector surface uniformly.
Solution Approach 2:
The patent implements periodic action through pulsed or cyclic heating patterns. Instead of continuous heating, the temperature control system applies thermal energy in periodic cycles, heating the collector surface when debris accumulation is detected and allowing cooling periods in between. This periodic temperature modulation achieves effective debris removal while significantly reducing average energy consumption compared to continuous heating.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution extends the collector's lifetime by at least 25% and maintains excellent reflectivity, ensuring high-quality EUV light generation and utilization in the EUV lithography process.
Implementation Method 1
a temperature control mechanism to prevent debris solidification and accumulation
Data Source
AI summary
An extreme ultraviolet (EUV) lithography system includes a vane bucket module. The vane bucket module includes a temperature adjusting pack and a collecting tank inserted into the temperature adjusting pack. The temperature adjusting pack has a plurality of inlets. The collecting tank has a cover and the cover includes a plurality of through holes. The inlets of the temperature adjusting pack are aligned with the through holes of the cover. Each through hole has a minimum depth at a first position and a maximum depth at a second position. The first position is closer to a center of the cover than the second position.