EUV Light Source Magnetic Field Debris Control
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Solution Overview
Problem
In EUV light source apparatuses, ion and neutral particles emitted during plasma generation cause contamination and damage to optical elements, reducing their reflectivity and operational lifespan.
Innovation Solution
A magnetic field is generated within the chamber to control the state of pre-plasma and main plasma, suppressing the production and removal of ion debris, thereby reducing contamination and damage to optical elements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a magnetic field is generated to trap ion debris, then the reflectivity of optical elements is improved, but the target nozzle is sputtered and damaged
Solution Approach 1:
A magnetic field is introduced as an intermediary substance to trap and control ion debris trajectories. The magnetic field acts as a mediator between the ion debris and optical elements, preventing direct collision while redirecting ions away from sensitive components through Lorentz force interaction.
Solution Approach 2:
The magnetic field strength and configuration are optimized to create specific trajectories for ion debris. By adjusting magnetic field parameters (strength, direction, spatial distribution), the system controls ion motion to achieve protective effect on optical elements while minimizing impact on target nozzle through precise parameter tuning.
2Reliability
If the magnetic field strength is increased to improve trapping efficiency, then ion debris control is enhanced, but neutral particles cannot be trapped and still adhere to optical surfaces
Solution Approach 1:
The debris control problem is segmented into two independent components: ion debris control through magnetic field and neutral particle control through separate mechanisms. This segmentation allows optimized treatment for each particle type without compromising the other, addressing the limitation of magnetic field's selective effectiveness.
Solution Approach 2:
In addition to the magnetic field intermediary for ions, a vacuum pumping system serves as an intermediary for neutral particles. The pump creates a vacuum environment that prevents neutral particle accumulation and adhesion on optical surfaces, complementing the magnetic field's ion trapping function.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution extends the operational life of optical elements by minimizing debris-related contamination and damage, ensuring longer and more stable operation of the EUV light source apparatus.
Implementation Method 1
a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma
Implementation Method 2
a first laser unit for applying a first laser beam to the target material to generate pre-plasma
Implementation Method 3
a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light
Data Source
AI summary
An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.