EUV Light Source Asymmetric Magnetic Field Particle Ejection
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Solution Overview
Problem
Current EUV light source apparatuses face challenges in efficiently ejecting charged particles from plasma, leading to contamination and damage of the EUV collector mirror, reduced EUV light efficiency due to target gas concentration, and increased operational costs due to complex magnetic field configurations and structural requirements.
Innovation Solution
An EUV light source apparatus with a single coil generating an asymmetric magnetic field to promptly eject charged particles, using a charged particle collection mechanism on the chamber surfaces, and a simplified structure to improve particle ejection efficiency and reduce contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a complex magnetic field configuration is used to eject charged particles, then particle ejection efficiency is improved, but device complexity and operational costs increase
Solution Approach 1:
The patent extracts and removes the charged particle collection function from the complex magnetic field configuration by introducing a separate charged particle collection mechanism. This mechanism includes charged particle collection plates positioned to receive particles directly, eliminating the need for complex magnetic field configurations and reducing both device complexity and operational costs while maintaining effective particle ejection.
Solution Approach 2:
The patent introduces charged particle collection plates as intermediary elements between the plasma generation region and the rest of the system. These plates serve as mediators that passively collect charged particles through electrostatic attraction, simplifying the overall system architecture compared to active magnetic field configurations while achieving the same particle ejection objective.
2Productivity
If the EUV collector mirror is positioned close to the plasma emission point, then EUV light collection efficiency is improved, but contamination and damage to the mirror increase
Solution Approach 1:
The patent introduces charged particle collection plates as intermediary elements positioned between the plasma emission point and the EUV collector mirror. These plates collect charged particles through electrostatic attraction, preventing them from reaching and damaging the mirror while allowing the mirror to be positioned close to the plasma source for optimal EUV light collection.
Solution Approach 2:
The patent removes charged particles from the vicinity of the EUV collector mirror by introducing a dedicated collection mechanism. This extraction of harmful particles allows the mirror to be positioned closer to the plasma source without suffering from contamination or damage, thereby improving EUV light collection efficiency.
3Reliability
If high flatness is required for the reflection surface of the EUV collector mirror, then reflectance and light use efficiency are improved, but manufacturing cost increases
Solution Approach 1:
The patent extracts charged particles from the plasma environment using collection plates, which prevents particle-induced damage to the mirror coating. This protection allows the use of standard manufacturing tolerances for the mirror reflection surface rather than requiring expensive high-flatness precision, while maintaining adequate reflectance and light use efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses contamination and damage to the EUV collector mirror, enhances EUV light efficiency by reducing target gas concentration, and lowers operational and maintenance costs through a simpler, more reliable design.
Implementation Method 1
magnetic field forming means for forming an asymmetric magnetic field in a generation position of the plasma by using a coil
Implementation Method 2
magnetic field forming means for forming an asymmetric magnetic field in a generation position of the plasma by using a coil
Implementation Method 3
charged particle collection mechanism provided on at least one of two surfaces of the chamber
Implementation Method 4
driver laser for applying a laser beam to the target material supplied by the target supply means to generate plasma
Implementation Method 5
driver laser for applying a laser beam to the target material supplied by the target supply means to generate plasma
Implementation Method 6
collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light
Implementation Method 7
collector mirror for collecting the extreme ultra violet light radiated from the plasma
Data Source
AI summary
In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.