EUV Mask Multi-Layer Capping for Carbon Contamination Control

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Solution Overview

Problem

Carbon contamination on EUV masks leads to non-uniform critical dimension formation and increased exposure energy requirements, affecting the efficiency and cost of semiconductor manufacturing.

Innovation Solution

A multi-layered capping feature with different carbon solubility properties is applied to the EUV mask, comprising layers with varying carbon solubility and EUV extinction coefficients to minimize carbon buildup and maintain effective EUV transmission.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If a single-layer capping feature is used on the EUV mask, then the structure is simple and manufacturing is easier, but carbon contamination builds up uniformly leading to non-uniform critical dimension formation and increased exposure energy requirements

Engineering Contradiction:
Improvecapping layer fabrication simplicityVSAvoidcritical dimension uniformity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The capping feature is divided into multiple layers (first capping layer and second capping layer) with different materials and carbon solubility properties. This segmentation allows each layer to perform different functions: the first layer provides a carbon sink with high carbon solubility, while the second layer provides a carbon barrier with low carbon solubility, together solving the carbon contamination problem that a single layer cannot address

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the capping feature (different layers) are given different material properties and carbon solubility characteristics. The first capping layer has high carbon solubility to absorb carbon contamination, while the second capping layer has low carbon solubility to prevent carbon diffusion. This local differentiation of properties enables precise control over carbon contamination at different depths of the capping structure

Inventive Principle:
Principle #3Local quality

2Reliability

If exposure energy is increased to compensate for carbon contamination, then pattern formation can be maintained, but manufacturing efficiency decreases and costs increase

Engineering Contradiction:
Improvepattern formation qualityVSAvoidmanufacturing efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The multi-layer capping structure is prepared in advance before EUV exposure, with the first capping layer positioned to absorb carbon contamination during the exposure process. This preliminary preparation of the carbon management system allows the mask to maintain optimal performance throughout production without requiring increased exposure energy, thus preserving manufacturing efficiency while ensuring pattern quality

Inventive Principle:
Principle #10Preliminary action

3Manufacturing precision

If a multi-layered capping feature with different carbon solubility properties is used, then carbon contamination is reduced and critical dimension uniformity is improved, but device complexity and manufacturing difficulty increase

Engineering Contradiction:
Improvecritical dimension uniformityVSAvoidcapping layer structure complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The carbon management function is extracted and separated into distinct layers: the first capping layer is specifically designed with high carbon solubility to handle carbon absorption, while the second capping layer is designed with low carbon solubility for barrier function. This extraction of the carbon management function into specialized layers simplifies the design logic compared to attempting to achieve both functions in a single complex material

Inventive Principle:
Principle #2Taking out (Extraction)

4Object-affected harmful factors

If carbon solubility varies across capping layers, then carbon buildup is minimized through differential absorption, but material selection and process complexity increase

Engineering Contradiction:
Improvecarbon contamination levelVSAvoidmaterial selection complexity
Core Design Contradiction:
Object-affected harmful factorsVSEase of manufacture

Solution Approach 1:

The carbon solubility parameter is deliberately changed between layers by selecting different materials: the first capping layer uses materials with high carbon solubility (such as certain metals or metal alloys) to absorb carbon, while the second capping layer uses materials with low carbon solubility (such as oxides or nitrides) to block carbon. This parameter change approach provides a systematic method for controlling carbon contamination through material selection rather than complex structural design

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The multi-layered capping feature reduces carbon contamination, ensuring consistent critical dimension uniformity and reducing the need for increased exposure energy, thereby enhancing manufacturing efficiency and reducing costs.

Implementation Method 1

A multi-layered capping feature with different carbon solubility properties is applied to the EUV mask, comprising layers with varying carbon solubility and EUV extinction coefficients to minimize carbon buildup

Methodology Applied
Scientific EffectCarbon solubility: Absorption (physical)

Implementation Method 2

A multi-layered capping feature with different carbon solubility properties is applied to the EUV mask, comprising layers with varying carbon solubility and EUV extinction coefficients

Methodology Applied
Scientific EffectEUV extinction: Absorption (EM radiation)

Data Source

PatentUS20250355341A1Extreme ultraviolet mask with capping layer
Publication Date: 2025.11.20 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20250355341A1 patent drawing
  • US20250355341A1 patent drawing
  • US20250355341A1 patent drawing

AI summary

An extreme ultraviolet (EUV) mask includes a substrate, a reflective multilayer stack on the substrate, and a multi-layer capping feature on the reflective multilayer stack. The multi-layer capping feature includes a first capping layer including a material containing an element having a first carbon solubility and a second capping layer including a material containing an element having a second carbon solubility. The first carbon solubility is different from the second carbon solubility. An element of the material of the first capping layer and an element of the material of the second capping layer have extinction coefficients for EUV radiation having a wavelength of 13.5 nm that are different.