EUV Mask Pod Laser Marks for Sensor Positioning
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Solution Overview
Problem
The smooth surface of mask pods in photolithography machines leads to unstable reflection light detection by sensors, making precise positioning of mask pods challenging during the photolithography process.
Innovation Solution
Incorporating laser-engraved marks on the mask pod with controlled surface roughness to generate a consistent voltage value upon reflection, allowing sensors to accurately detect and confirm the pod's location.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the mask pod surface is kept smooth, then the mask pod can be easily manufactured and cleaned, but the reflection light detection by sensors becomes unstable and positioning precision deteriorates
Solution Approach 1:
The patent applies local quality by creating marks only at specific positions on the mask pod where sensors need to detect them, while keeping the rest of the mask pod surface smooth. This allows the mask pod to maintain its overall smoothness for easy manufacturing and cleaning, while introducing localized surface features that provide stable reflection light signals for precise positioning.
2Measurement precision
If marks are added to the mask pod surface, then positioning precision improves, but the mask pod surface complexity increases
Solution Approach 1:
The patent implements local quality by placing marks only at specific locations where sensors need to detect them, rather than making the entire mask pod surface complex. This localized approach minimizes the increase in surface complexity while still achieving the required positioning precision.
Solution Approach 2:
The patent uses parameter changes by controlling the surface roughness of the marks through laser engraving depth and width parameters. By adjusting these parameters, the marks provide sufficient reflection light signals for stable sensor detection without creating excessive surface complexity.
3Reliability
If laser engraving is used to create marks, then positioning reliability improves, but energy consumption increases
Solution Approach 1:
The patent applies preliminary action by creating the marks on the mask pod before the mask pod is used in the photolithography process. The laser engraving is performed in advance during mask pod preparation, so that when the mask pod is later positioned in the machine, the marks are already in place and require no additional energy input during the actual positioning and processing operations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures precise positioning of the mask pod by maintaining a stable voltage range from the reflection light, preventing incorrect loading and enhancing the accuracy of the photolithography process.
Implementation Method 1
One or more mark is formed on the EUV pod using laser engraving for changing the surface roughness
Implementation Method 2
By ensuring the voltage value generated by the reflection light from the one or more mark
Implementation Method 3
the voltage value generated by the reflection light from the one or more mark
Data Source
AI summary
The present invention relates to an EUV pod having marks, which comprises a mask pod and one or more mark disposed on the mask pod. One or more sensor of a processing machine is used for detecting the one or more mark. By including the one or more mark, the surface roughness of one or more region of the mask pod detectable by the one or more sensor can be altered. The one or more sensor emits light to the mask pod, which reflects the light to the one or more sensor. The one or more sensor receives the reflection light from the mask pod and judges if the voltage generated by the reflection light falls within the reflection ranges of the mark. Thereby, whether the one or more sensor corresponds to the one or more make can be confirmed.