AI-Controlled EUV Mask Stocker for Nitrogen Purity Control
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Solution Overview
Problem
In semiconductor fabrication, the lack of adequate nitrogen gas supply in EUV pod storage systems leads to contamination and reduced lithography quality due to moisture precipitation and hydrocarbon damage, affecting the ability of EUV masks to pattern features within critical dimension limits.
Innovation Solution
An AI-driven dynamic controller is integrated into the stocker system to manage gas supply, pressure, humidity, and hydrocarbon concentration, ensuring a controlled environment by using nitrogen gas to reduce contamination and hydrocarbon levels, and maintaining independent air supply to prevent cross-contamination with other EUV lithography tools.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If nitrogen gas supply is increased to reduce contamination and hydrocarbon levels, then lithography quality improves, but system complexity and operational difficulty increase due to the need for dynamic control of gas flow, pressure, humidity, and temperature
Solution Approach 1:
The patent implements a dynamic control system that continuously monitors contamination levels, hydrocarbon concentrations, gas pressure, humidity, and temperature within the storage system. Based on real-time sensor data, the AI-driven controller automatically adjusts nitrogen gas flow rates and environmental parameters to maintain optimal storage conditions, eliminating the need for manual intervention while ensuring lithography quality
Solution Approach 2:
The storage system is equipped with self-regulating capabilities where the AI-driven controller autonomously manages gas supply, pressure regulation, humidity control, and temperature maintenance. The system self-corrects environmental deviations and contamination issues without external control, reducing operational complexity while maintaining high lithography standards
2Object-affected harmful factors
If dynamic control of gas supply and environmental parameters is implemented, then contamination and hydrocarbon levels are reduced, but operational complexity and difficulty increase
Solution Approach 1:
The system performs self-monitoring and self-regulation of gas supply, pressure, humidity, and temperature through integrated sensors and an AI-driven controller. The controller automatically adjusts environmental parameters to maintain contamination levels below thresholds, eliminating the need for manual operational intervention
Solution Approach 2:
Manual mechanical control of gas valves, pressure regulators, and environmental controls is replaced with an automated electronic control system. The AI-driven controller uses algorithms to dynamically adjust gas flow rates and environmental parameters based on real-time sensor feedback, reducing operational difficulty while effectively controlling contamination
3Object-affected harmful factors
If independent air supply systems are maintained for each EUV lithography tool, then cross-contamination is prevented, but gas consumption and operational complexity increase
Solution Approach 1:
The nitrogen gas supply system is designed to serve multiple EUV lithography tools simultaneously while maintaining independent environmental control for each tool's storage system. The AI-driven controllers coordinate gas supply across tools, allowing centralized gas distribution with decentralized environmental management, reducing overall gas consumption while preventing cross-contamination
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The AI-driven dynamic controller effectively reduces contamination, maintains optimal storage conditions, and ensures operator safety by automatically controlling gas flow and pressure, thereby improving lithography quality and preventing adverse effects on EUV masks.
Implementation Method 1
supplying a first gas into a storage space configured to store one or more substrates
Implementation Method 2
detecting a humidity level of the storage space
Implementation Method 3
detecting a hydrocarbon concentration within the storage space
Implementation Method 4
increasing the supply of the first gas into the storage space in response to the detected hydrocarbon concentration within the storage space being higher than a threshold concentration
Data Source
AI summary
An EUV stocker and an EUV pod device is disclosed. The EUV stocker includes an AI driven dynamic control circuitry, an AI controlled safety interlock, and an independent air return control device. The EUV stocker includes a Mass Flow Control (MFC) that operates in conjunction with one or more valves. The EUV stocker further includes a hydrocarbon detecting assembly, oxygen detecting assembly, pressure detecting assembly, and temperature detecting assembly and more to maintain the required condition within the EUV stocker. The EUV stocker also includes automated transportation devices such as AMHS, OHT, MR, AGV, RGV, or the like to provide a safe EUV mask storage environment for operators.