EUV Lithography Mirror with Actuator Matrix for Aberration Correction
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Solution Overview
Problem
EUV lithography apparatuses face challenges in achieving high stiffness for mirrors to prevent deformation during high acceleration and frequency positioning, while also requiring controlled deformation to correct imaging aberrations, which is difficult with thin mirrors.
Innovation Solution
An optical system with a stiff mirror main body and a deformable actuator matrix between the mirror main body and the optically effective surface, allowing for dynamic deformability to correct heat-induced deformations and maintain high-frequency positioning without deforming the mirror main body, using a multiplicity of piezoactuators arranged in a matrix form.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the mirror is made thin to enable controlled deformation for correcting imaging aberrations, then the deformability is improved, but the stiffness deteriorates
Solution Approach 1:
The mirror system is segmented into two distinct components: a thin deformable mirror substrate that provides the necessary surface deformation capability for aberration correction, and a separate stiff support structure that maintains positional stability during high-frequency positioning. This segmentation allows each component to be optimized for its specific function without compromise.
Solution Approach 2:
A support structure acts as an intermediary between the deformable mirror substrate and the manipulation system. This intermediary provides the necessary mechanical support and stiffness while allowing the mirror substrate to deform independently for aberration correction, thus mediating between the conflicting requirements of deformability and stiffness.
2Stability of the object's composition
If the mirror is made thick to increase stiffness for high-frequency positioning, then the stability is improved, but the deformability deteriorates
Solution Approach 1:
The mirror system is segmented into two distinct components: a thin deformable mirror substrate that provides the necessary surface deformation capability for aberration correction, and a separate stiff support structure that maintains positional stability during high-frequency positioning. This segmentation allows each component to be optimized for its specific function without compromise.
Solution Approach 2:
A support structure acts as an intermediary between the deformable mirror substrate and the manipulation system. This intermediary provides the necessary mechanical support and stiffness while allowing the mirror substrate to deform independently for aberration correction, thus mediating between the conflicting requirements of deformability and stiffness.
3Adaptability or versatility
If a deformable thin-walled mirror is used to correct imaging aberrations, then the adaptability is improved, but the strength deteriorates
Solution Approach 1:
The mirror system is segmented into two distinct components: a thin deformable mirror substrate that provides the necessary surface deformation capability for aberration correction, and a separate stiff support structure that maintains positional stability during high-frequency positioning. This segmentation allows each component to be optimized for its specific function without compromise.
Solution Approach 2:
A support structure acts as an intermediary between the deformable mirror substrate and the manipulation system. This intermediary provides the necessary mechanical support and stiffness while allowing the mirror substrate to deform independently for aberration correction, thus mediating between the conflicting requirements of deformability and stiffness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise control of reflection properties and correction of imaging aberrations, maintaining high stiffness and preventing deformation of the mirror main body during positioning and deformation, allowing for efficient EUV and DUV radiation handling.
Implementation Method 1
The actuator matrix includes a multiplicity of piezoactuators arranged in a matrix form
Implementation Method 2
a manipulator device for positioning and/or orienting the mirror main body, wherein a gap for spacing apart the actuator matrix from the mirror main body is provided between the actuator matrix and a front side of the mirror main body
Implementation Method 3
an optically effective surface for reflecting radiation
Data Source
AI summary
An optical system for a lithography machine includes: a main mirror element and a manipulator device for positioning and/or orienting said main mirror element. The optical system also includes an optically active surface for reflecting radiation. The optical system further includes an actuator matrix positioned between the main mirror element and the optically active surface. The actuator matrix is configured to deform the optically active surface to influence the reflective properties of the optically active surface. A gap is present between the actuator matrix and a front side of the main mirror element so that the actuator matrix is spaced apart from the main mirror element.