EUV Light Focusing Mirror Cooling Shield
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing extreme ultraviolet light generation apparatuses face challenges in maintaining the reflectivity of EUV light focusing mirrors due to tin deposition, which affects the EUV light focusing performance, and insufficient cooling of the hydrogen gas release unit leads to deformation and altered gas flow patterns.
Innovation Solution
Incorporating a hydrogen gas release unit with a cooling medium channel that cools the areas around the openings where hydrogen gas is released, preventing tin deposition and maintaining the structural integrity and gas flow efficiency, and integrating the hydrogen gas release unit with a shield to optimize cooling and prevent deformation of the EUV light focusing mirror.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If hydrogen gas is released without sufficient cooling, then gas flow patterns are altered and structural deformation occurs, but the cooling mechanism prevents tin deposition and maintains structural integrity
Solution Approach 1:
The patent introduces a cooling medium channel that changes the temperature parameter of the hydrogen gas release unit by circulating a cooling medium through the channel, thereby preventing thermal deformation and maintaining structural integrity under high temperature conditions
Solution Approach 2:
The cooling medium acts as an intermediary substance that transfers heat away from the hydrogen gas release unit through the cooling medium channel, preventing direct thermal damage to the structure while allowing the hydrogen gas release function to continue
2Reliability
If cooling is insufficient, then tin deposition occurs on the hydrogen gas release unit, but the cooling mechanism prevents deposition and maintains functionality
Solution Approach 1:
The cooling medium channel changes the temperature parameter of the hydrogen gas release unit surface, creating conditions that prevent tin deposition by maintaining the surface temperature below the deposition threshold while preserving the unit's gas release functionality
Solution Approach 2:
The patent converts the harmful thermal effect that causes tin deposition into a beneficial condition by using the same thermal field to drive convection currents that prevent deposition when properly managed through the cooling medium channel
3Reliability
If the EUV light focusing mirror is not protected, then reflectivity decreases due to tin deposition, but the cooling and shielding mechanism maintains reflectivity and focusing performance
Solution Approach 1:
The shield member acts as an intermediary protective barrier between the tin plasma and the EUV light focusing mirror, preventing direct contamination while the cooling medium channel removes heat that would otherwise cause deposition on the mirror surface, thereby maintaining reflectivity and focusing performance
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The cooling mechanism effectively prevents tin deposition on the hydrogen gas release unit, maintains the shape and functionality of the EUV light focusing mirror, and ensures optimal hydrogen gas flow, thereby enhancing the EUV light generation apparatus's performance and reliability.
Implementation Method 1
a first cooling medium channel through which a cooling medium passes
Implementation Method 2
an opening configured to release a hydrogen gas inward from around the EUV light focusing mirror
Data Source
AI summary
An extreme ultraviolet light generation apparatus includes: a chamber; an EUV light focusing mirror located in the chamber; and a hydrogen gas release unit that is located in the chamber and includes an opening configured to release a hydrogen gas inward from around the EUV light focusing mirror and a first cooling medium channel through which a cooling medium passes.