EUV Light Concentrating Mirror Debris Suppression via Partition Wall Gas Flow
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Solution Overview
Problem
Current EUV light generation apparatuses face challenges in preventing debris deposition on EUV light concentrating mirrors due to stagnant gas flow regions, requiring complex gas nozzle structures and precise flow control to maintain high deposition suppression efficiency.
Innovation Solution
Incorporating a first partition wall with strategically positioned openings and a gas exhaust port to create distinct gas flow regions within the chamber, ensuring higher pressure in areas where EUV light is concentrated and exhausting gases to prevent debris accumulation on the mirrors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If complex gas nozzle structures are used to prevent debris deposition, then deposition suppression efficiency is improved, but device complexity increases
Solution Approach 1:
The chamber is divided into multiple regions using partition walls, with each region having independent gas supply and exhaust control. This segmentation allows targeted debris suppression in critical areas without requiring complex nozzles throughout the entire chamber, thereby maintaining high deposition suppression efficiency while reducing overall system complexity.
Solution Approach 2:
Different regions of the chamber are provided with different gas flow characteristics tailored to their specific needs. The plasma generation region receives gas flow optimized for debris removal, while the EUV light concentration region maintains conditions optimal for light focusing. This localized optimization achieves high deposition suppression efficiency without requiring uniformly complex nozzle structures everywhere.
2Reliability
If precise gas flow control is implemented to maintain high deposition suppression efficiency, then reliability is improved, but device complexity increases
Solution Approach 1:
The gas flow control system is segmented into independent control zones corresponding to different chamber regions. Each zone has its own gas supply and exhaust ports that can be controlled independently, allowing precise flow management in critical areas without requiring complex centralized control of the entire system.
Solution Approach 2:
The partition wall structure itself facilitates gas flow differentiation and debris removal through its geometric design and positioning. The partition walls create natural flow patterns and pressure differentials that enhance debris suppression without requiring additional active control mechanisms, thereby achieving reliable deposition suppression with simpler control systems.
3Productivity
If partition walls with openings are used to create distinct gas flow regions, then gas flow dynamics are improved, but device complexity increases
Solution Approach 1:
The chamber is segmented into functionally distinct regions using partition walls with strategically placed openings. These openings allow controlled gas flow and debris removal while maintaining separate optimization zones for plasma generation and EUV light concentration, thereby improving overall productivity without requiring overly complex chamber structures.
Solution Approach 2:
The partition walls serve multiple functions simultaneously: they physically separate different gas flow regions, guide debris-laden gas away from critical areas, support gas supply and exhaust ports, and maintain structural integrity of the chamber. This multi-functionality achieves improved productivity without proportionally increasing structural complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively suppresses debris deposition on EUV light concentrating mirrors by maintaining optimal gas flow dynamics, reducing the complexity of gas nozzle structures and improving the accuracy of flow control, thereby enhancing the efficiency of EUV light generation.
Implementation Method 1
a laser produced plasma (LPP) type apparatus using plasma generated by irradiating a target substance with pulse laser light
Implementation Method 2
an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light
Data Source
AI summary
An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.