EUV Condensing Mirror Gas Flow and Debris Prevention
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Solution Overview
Problem
In extreme ultraviolet light generation systems, debris from the target substance accumulates on the EUV condensing mirror, reducing its reflectance and affecting the generation of high-quality EUV light, as existing gas flow configurations fail to effectively prevent debris from reaching the mirror.
Innovation Solution
The system incorporates multiple nozzles arranged around the EUV condensing mirror to feed gases in specific directions, creating a dominant gas flow that prevents debris from reaching the mirror, combined with an exhaust mechanism to maintain chamber pressure and remove debris, and optionally includes a cooling mechanism to prevent tin deposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single gas supply configuration is used, then the device complexity is reduced, but debris accumulates on the EUV condensing mirror reducing reflectance
Solution Approach 1:
The gas supply system is divided into multiple nozzles (first nozzle, second nozzle, third nozzle) positioned at different locations around the EUV condensing mirror. Each nozzle supplies gas in a different direction to create comprehensive protective gas flow that prevents debris from reaching the mirror surface, thereby resolving the contradiction between maintaining high reflectance and avoiding excessive system complexity.
Solution Approach 2:
Gas is supplied at specific locations (outer peripheral portion of the EUV condensing mirror) in specific directions (along the reflective surface, away from the mirror) to create localized protective gas flow zones. This targeted approach ensures debris prevention at critical areas without requiring a uniformly complex gas supply system throughout the entire chamber.
2Reliability
If multiple nozzles are added to prevent debris, then debris accumulation is reduced, but the device complexity increases
Solution Approach 1:
The multiple nozzles serve multiple functions: they supply protective gas to prevent debris accumulation, maintain chamber pressure distribution, and work协同 with the exhaust port to remove debris. This multi-functionality justifies the increased number of components by providing comprehensive protection rather than requiring separate systems for each function.
Solution Approach 2:
Gas acts as an intermediary substance that mediates between the plasma generation region (where debris is produced) and the EUV condensing mirror (where debris would cause damage). The multiple nozzles introduce this intermediary gas at strategic points to create a protective atmosphere that prevents direct contact between debris and the mirror surface.
3Reliability
If gas flow is increased to prevent debris, then debris removal is improved, but chamber pressure control becomes difficult
Solution Approach 1:
The system incorporates an exhaust port that works in conjunction with the multiple gas supply nozzles to maintain pressure balance. The exhaust port removes excess gas and debris from the chamber, providing feedback control that prevents pressure buildup while ensuring sufficient gas flow to protect the mirror. This balanced approach resolves the contradiction between debris removal efficiency and pressure control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively prevents debris accumulation on the EUV condensing mirror, maintaining high reflectance and ensuring efficient EUV light generation by controlling gas flow and using a cooling mechanism to manage tin deposition.
Implementation Method 1
a laser device configured to irradiate the target with a pulse laser beam to turn the target into plasma
Implementation Method 2
irradiating a target with a pulse laser beam to generate extreme ultraviolet light
Implementation Method 3
an EUV condensing mirror arranged in the chamber... reflecting the extreme ultraviolet light toward a second focal point
Implementation Method 4
a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror
Implementation Method 5
an exhaust port arranged in the chamber
Implementation Method 6
optionally includes a cooling mechanism to prevent tin deposition
Data Source
AI summary
An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.